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Alexander V. Rumyantsev

Observed names: A. V. Rumyantsev, A.V. Rumyantsev, Alexander V Rumyantsev, Rumyantsev A. V., А. V. Rumyantsev, А. В. Румянцев, А.В. Румянцев, Румянцев Александр Владимирович
ORCID: 0000-0002-4966-0486
Observed ORCID: 0000-0002-4966-0486
OpenAlex ID: A5001384712
Simulation of material sputtering with a focused ion beam
2015 · N. I. Borgardt, R. L. Volkov, et al. · Technical Physics Letters · 25
Sputtering of redeposited material in focused ion beam silicon processing
2018 · Nikolay I Borgardt, Alexander V Rumyantsev, et al. · Materials Research Express · 18
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Prediction of surface topography due to finite pixel spacing in FIB milling of rectangular boxes and trenches
2016 · Nikolay I. Borgardt, Alexander V. Rumyantsev · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 17
Study of silicon dioxide focused ion beam sputtering using electron microscopy imaging and level set simulation
2022 · Alexander V. Rumyantsev, Nikolai I. Borgardt, et al. · Vacuum · 16
Characterizing interface structure between crystalline and ion bombarded silicon by transmission electron microscopy and molecular dynamics simulations
2020 · Alexander V. Rumyantsev, Nikolay I. Borgardt, et al. · Applied Surface Science · 13
Simulation of Redeposited Silicon Sputtering under Focused Ion Beam Irradiation
2018 · A. V. Rumyantsev, N. I. Borgardt, et al. · Journal of Surface Investigation X-ray Synchrotron and Neutron Techniques · 10
Study of Gallium-Ion-Induced Silicon Amorphization by Matching Experimental and Simulated Electron-Microscopy Images
2020 · A. V. Rumyantsev, A. S. Prikhodko, et al. · Journal of Surface Investigation X-ray Synchrotron and Neutron Techniques · 5
Reducing ion implantation in focused ion beam nanofabrication
2025 · Alexander V. Rumyantsev, Nikolai I. Borgardt, et al. · Nanoscale · 4
Level set simulation of focused ion beam sputtering of a multilayer substrate
2024 · Alexander V Rumyantsev, Nikolai I Borgardt, et al. · Beilstein Journal of Nanotechnology · 3
Simulation of Material Sputtering and Gallium Implantation during Focused Ion Beam Irradiation of a Silicon Substrate
2023 · O. V. Podorozhniy, A. V. Rumyantsev, et al. · Semiconductors · 3
Prediction of surface topography due to finite pixel spacing in focused ion beam milling of circular holes and trenches
2018 · Alexander V. Rumyantsev, Nikolay I. Borgardt · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 3
Study of Silicon Dioxide Sputtering by a Focused Gallium Ion Beam
2024 · O. V. Podorozhniy, A. V. Rumyantsev, et al. · Journal of Surface Investigation X-ray Synchrotron and Neutron Techniques · 2
Simulation of focused ion beam milling of multilayer substrates
2023 · Rumyantsev A. V., Borgardt N. I., et al. · Письма в журнал технической физики · 2
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Investigation of the Dependence of the Silicon Needle Shape on the KOH Solution Concentration during Anisotropic Wet Etching
2023 · A. V. Novak, A. M. Sokolov, et al. · Semiconductors · 2
Особенности морфологии и структуры тонких пленок кремния
2021 · А. В. Новак, В. Р. Новак, et al. · Поверхность Рентгеновские синхротронные и нейтронные исследования · 2
Features of the Manufacturing Process of Silicon Tips for Cantilevers
2021 · A.V. Novak, JSC «Angstrem», Moscow, Russia, et al. · Proceedings of Universities ELECTRONICS · 2
МОДЕЛИРОВАНИЕ РАСПЫЛЕНИЯ ВТОРИЧНО ОСАЖДЕННОГО КРЕМНИЯ ПРИ ВОЗДЕЙСТВИИ ФОКУСИРОВАННЫМ ИОННЫМ ПУЧКОМ, "Поверхность. Рентгеновские, синхротронные и нейтронные исследования"
2018 · А. В. Румянцев, Н.И. Боргардт, et al. · Поверхность Рентгеновские синхротронные и нейтронные исследования · 2
Study of Silicon Amorphization by Xenon Ions Using Transmission Electron Microscopy and Monte Carlo Simulation
2025 · O. V. Podorozhniy, A. V. Rumyantsev, et al. · Journal of Surface Investigation X-ray Synchrotron and Neutron Techniques · 1
Study of silicon dioxide sputtering by a focused gallium ion beam
2025 · О. V. Podorozhniy, А. V. Rumyantsev, et al. · Поверхность Рентгеновские синхротронные и нейтронные исследования · 1
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Features of the Morphology and Structure of Thin Silicon Films
2021 · A. V. Novak, V. R. Novak, et al. · Journal of Surface Investigation X-ray Synchrotron and Neutron Techniques · 1
Study of the Dependence of Probe Tip Wear When Scanning a Hard, Rough Surface in Various Modes of Amplitude-Modulation Atomic Force Microscopy
2026 · A. V. Novak, V. R. Novak, et al. · Journal of Surface Investigation X-ray Synchrotron and Neutron Techniques
Формирование осесимметричных структур в диоксиде кремния методом фокусированного ионного пучка в краевом режиме построчного сканирования
2026 · Румянцев Александр Владимирович, Боргардт Николай Иванович, et al. · Proceedings of Universities ELECTRONICS
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The Influence of Focused Ion Beam Scanning Strategy on the Silicon Sputtering Process During the Formation of Micro- and Nanostructures
2025 · A. V. Rumyantsev, N. I. Borgardt, et al. · Semiconductors
Electron Microscopic Studies of Single-Crystal Silicon after Irradiation with Low-Energy Xenon Ions
2025 · O. V. Podorozhniy, G. S. Kireev, et al. · Semiconductors
Structure of crystalline silicon bombarded with low-energy xenon ions studied using electron microscopy and molecular dynamics simulations
2025 · Oleg V. Podorozhniy, Alexander V. Rumyantsev, et al. · Applied Surface Science
Works count: 36
Citation count: 132
H-index: 6
I10-index: 6
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