Author

Konstantin Karavaev

Observed names: K Karavaev, K. Karavaev, Karavaev, K., Karavaev, Konstantin

Institution: Brandenburg University of Technology Cottbus-Senftenberg

Observed institution: Brandenburg University of Technology Cottbus-Senftenberg

OpenAlex ID: A5002794967

The initial atomic layer deposition of HfO2∕Si(001) as followed in situ by synchrotron radiation photoelectron spectroscopy

2008 · Massimo Tallarida, Konstantin Karavaev, et al. · Journal of Applied Physics · 31

In situ studies of the atomic layer deposition of thin HfO2 dielectrics by ultra high vacuum atomic force microscope

2009 · Krzysztof Kolanek, Massimo Tallarida, et al. · Thin Solid Films · 16

Hf O 2 ∕ Si interface formation in atomic layer deposition films: An in situ investigation

2009 · Massimo Tallarida, Konstantin Karavaev, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 15

Atomic layer deposition reactor for fabrication of metal oxides

2011 · Krzysztof Kolanek, Massimo Tallarida, et al. · Physica status solidi. C, Conferences and critical reviews/Physica status solidi. C, Current topics in solid state physics · 9

In‐Situ Studies of ALD Growth of Hafnium Oxide Films

2009 · Konstantin Karavaev, Krzysztof Kolanek, et al. · Advanced Engineering Materials · 9

Al-oxynitride interfacial layer investigations for PrXOYon SiC and Si

2008 · K Henkel, K Karavaev, et al. · Journal of Physics Conference Series · 9

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PrOAlN dielectrics for metal insulator semiconductor stacks

2010 · Karsten Henkel, Mohamed Torche, et al. · physica status solidi (a) · 7

Novel "In-situ2" Approach to Modified ALD Processes for Nano-functional Metal Oxide Films

2009 · Massimo Tallarida, Konstantin Karavaev, et al. · ECS Transactions · 6

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Optimization of the AlON buffer layer for PrXOY/Si stacks

2009 · K. Henkel, Y. Burkov, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 6

In situ measurements of the atomic layer deposition of high-k dielectrics by atomic force microscope for advanced microsystems

2009 · Krzysztof Kolanek, Massimo Tallarida, et al. · International Students and Young Scientists workshop Photonics and Microsystems · 2

In-situ Atomic Layer Deposition growth of Hf-oxide

2011 · Konstantin Karavaev

Atomic layer deposition of HfO2 onto SiO2 substrates investigated in-situ by non-contact UHV/AFM

2010 · Krzysztof Kolanek, Konstantin Karavaev, et al.

Novel "In Situ2" Approach to Modified ALD Processes for Nanofunctional Metal Oxide Films

2009 · Massimo Tallarida, Konstantin Karavaev, et al. · ECS Meeting Abstracts

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Basics of the atomic layer deposition of HfO2 onto Si/SiO2 substrates: in-situ investigations with XPS, XAS and UHV-AFM

2009 · Massimo Tallarida, Konstantin Karavaev, et al.

Evolution of the interfacial layer during the atomic layer deposition of HfO2 on Si/SiO2 substrates