Get started
Author

Jos P. H. Benschop

Observed names: J P H Benschop, J. Benschop, J. P. Benschop, J. P. H. Benschop, J.P.H. Benschop, Jos Benschop, Jos P H Benschop, Jos P. Benschop, Josef P. Benschop
ORCID: 0000-0002-7992-9992
Observed ORCID: 0000-0002-7992-9992
OpenAlex ID: A5003991994
Extreme ultraviolet lithography: Status and prospects
2008 · Jos Benschop, Vadim Banine, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 101
The future of EUV lithography: enabling Moore's Law in the next decade
2017 · Alberto Pirati, Jan van Schoot, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 70
Confocal compact scanning optical microscope based on compact disc technology
1991 · Jos Benschop, Gerard van Rosmalen · Applied Optics · 68
High-NA EUV lithography exposure tool: program progress
2020 · Jan Van Schoot, Eelco van Setten, et al. · SPIE Conference on Extreme Ultraviolet (EUV) Lithography · 64
Lithography for now and the future
2019 · M.A. van de Kerkhof, J.P.H. Benschop, et al. · Solid-State Electronics · 58
High-NA EUV lithography exposure tool: advantages and program progress
2020 · Jan Van Schoot, Sjoerd Lok, et al. · 50
Blister formation in Mo/Si multilayered structures induced by hydrogen ions
2017 · R A J M van den Bos, C J Lee, et al. · Journal of Physics D Applied Physics · 38
PDF
Holistic optimization architecture enabling sub-14-nm projection lithography
2014 · Jan Mulkens, Paul C. Hinnen, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 37
Relationship between an EUV source and the performance of an EUV lithographic system
2000 · Vadim Banine, Jos P. Benschop, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 33
Mitigation of surface contamination from resist outgassing in EUV lithography
2000 · B.M. Mertens, B. van der Zwan, et al. · Microelectronic Engineering · 32
Progress of the EUVL alpha tool
2001 · Hans Meiling, Jos P. Benschop, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 31
High-NA EUV lithography enabling Moore’s law in the next decade
2017 · Jan van Schoot, Kars Troost, et al. · International Conference on Extreme Ultraviolet Lithography · 24
High-NA EUV lithography exposure tool: key advantages and program progress
2021 · Jan Van Schoot, Sjoerd Lok, et al. · Extreme Ultraviolet (EUV) Lithography · 21
Integrated scatterometry for tight overlay and CD control to enable 20-nm node wafer manufacturing.
2013 · Jos Benschop, Andre Engelen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 20
Strengthening ultrathin Si3N4 membranes by compressive surface stress
2020 · A. Shafikov, B. Schurink, et al. · Sensors and Actuators A Physical · 19
PDF
Comparison of Extreme Ultraviolet Sources for Lithography Applications
2000 · V.Y. Banine, J.P.H. Benschop, et al. · Microelectronic Engineering · 17
Special Section Guest Editorial: EUV Lithography for the 3-nm Node and Beyond
2017 · Vivek Bakshi, Hakaru Mizoguchi, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 14
PDF
EUCLIDES: European EUVL Program
1999 · Jos P. H. Benschop, Anton J. J. van Dijsseldonk, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 14
EUV lithography: past, present and future
2021 · Jos P. Benschop · Extreme Ultraviolet (EUV) Lithography · 13
Influence of internal stress and layer thickness on the formation of hydrogen induced thin film blisters in Mo/Si multilayers
2018 · R A J M van den Bos, J Reinink, et al. · Journal of Physics D Applied Physics · 12
PDF
The future of EUV lithography: continuing Moore's Law into the next decade
2018 · Jan van Schoot, Kars Troost, et al. · Extreme Ultraviolet (EUV) Lithography · 11
EXTATIC: ASML's α-tool development for EUVL
2002 · Hans Meiling, Jos P. Benschop, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11
Experimental results of the stochastic Coulomb interaction in ion projection lithography
1999 · P. W. H. de Jager, G. Derksen, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 11
EUCLIDES: first phase completed!
2000 · Jos P. Benschop, Udo Dinger, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10
Bifunctional catalytic effect of Mo2C/oxide interface on multi-layer graphene growth
2021 · Seda Kizir, Wesley T. E. van den Beld, et al. · Scientific Reports · 9
PDF
Works count: 52
Citation count: 875
H-index: 16
I10-index: 24
Year
Topic
Type