Author

Daniel A. Tichenor

Observed names: D Tichenor, D. A. Tichenor, D. Tichenor, D.A. Tichenor, Daniel A Tichenor, Daniel Tichenor, Tichenor, Daniel A., Tichenor, Daniel A. (Castro Valley, CA), Tichenor, Daniel A. (Castro Valley, CA); Kubiak, Glenn D. (Livermore, CA); Haney, Steven J. (Tracy, CA); Sweeney, Donald W. (San Ramon, CA), Tichenor, Daniel A.; Kubiak, Glenn D.; Lee, Sang Hun

Institutions: Sandia National Laboratories California, Sandia National Laboratories

Observed institutions: AT&T (United States), Sandia National Laboratories California, Sandia National Laboratories, Stanford University

OpenAlex ID: A5004679976

Simultaneous in situ measurement of the size, temperature and velocity of particles in a combustion environment

1985 · D.A. Tichenor, R.E. Mitchell, et al. · Symposium (International) on Combustion · 74

Volume, index-of-refraction, and stress changes in electron-irradiated vitreous silica

1977 · T. A. Dellin, D. A. Tichenor, et al. · Journal of Applied Physics · 70

Optically determined temperatures, sizes, and velocities of individual carbon particles under typical combustion conditions

1985 · S. Niksa, R.E. Mitchell, et al. · Combustion and Flame · 51

Coherent Transfer Function*

1972 · D. A. Tichenor, J. W. Goodman · Journal of the Optical Society of America · 49

Diffraction-limited soft-x-ray projection imaging using a laser plasma source

1991 · D. A. Tichenor, R. R. Freeman, et al. · Optics Letters · 44

System integration and performance of the EUV engineering test stand

2001 · Daniel A. Tichenor, Avijit K. Ray-Chaudhuri, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 41

Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic

2002 · Patrick Naulleau, Kenneth A. Goldberg, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 38

First lithographic results from the extreme ultraviolet Engineering Test Stand

2001 · H. N. Chapman, A. K. Ray-Chaudhuri, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 37

EUV engineering test stand

2000 · Daniel A. Tichenor, Glenn D. Kubiak, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 35

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Particle size measurements using an optical variable-frequency-grid technique

1981 · James C. F. Wang, Daniel A. Tichenor · Applied Optics · 26

Diffraction-limited soft x-ray projection lithography with a laser plasma source

1991 · G. D. Kubiak, D. A. Tichenor, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 23

Sub-100-nm lithographic imaging with an EUV 10X microstepper

1999 · John E. M. Goldsmith, Kurt W. Berger, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 22

Initial results from the EUV engineering test stand

2001 · Daniel A. Tichenor, Avijit K. Ray-Chaudhuri, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 21

Computer Analysis Of Holographic Interferograms For Nondestructive Testing

1979 · D. A. Tichenor, V. P. Madsen · Optical Engineering · 21

Soft X-Ray and EUV Imaging Systems II

2001 · Daniel A. Tichenor, James A. Folta · 17

Recent results in the development of an integrated EUVL laboratory tool

1995 · Daniel A. Tichenor, Glenn D. Kubiak, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 16

Fraunhofer diffraction of concentric annular slits*

1973 · D. Tichenor, R. N. Bracewell · Journal of the Optical Society of America · 13

Soft-x-ray projection lithography experiments using Schwarzschild imaging optics

1993 · D. A. Tichenor, G. D. Kubiak, et al. · Applied Optics · 12

Performance upgrades in the EUV engineering test stand

2002 · Daniel A. Tichenor, William C. Replogle, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11

Static microfield printing at the Advanced Light Source with the ETS Set-2 optic

2002 · Patrick P. Naulleau, Kenneth A. Goldberg, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11

Fabrication of metal–oxide–semiconductor devices with extreme ultraviolet lithography

1996 · K. B. Nguyen, G. F. Cardinale, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 11

Characterization of AZ PN114 resist for soft-x-ray projection lithography

1993 · K. Early, D. M. Tennant, et al. · Applied Optics · 11

Lithographic evaluation of the EUV engineering test stand

2002 · Sang Hun Lee, Daniel A. Tichenor, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10

Development of a laboratory extreme-ultraviolet lithography tool

1994 · Daniel A. Tichenor, Glenn D. Kubiak, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9

System and process learning in a full-field, high-power EUVL alpha tool

2003 · William P. Ballard, Daniel A. Tichenor, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8

Works count: 89

Citation count: 788

H-index: 16

I10-index: 23