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Author

Robert Heinke

ORCID: 0000-0002-1199-1407
Observed ORCID: 0000-0002-1199-1407
OpenAlex ID: A5004837828
Dry Etching of Germanium with Laser Induced Reactive Micro Plasma
2021 · Martin Ehrhardt, Pierre Lorenz, et al. · Lasers in Manufacturing and Materials Processing · 19
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Low surface damage laser processing of silicon by laser-induced plasma etching (LIPE)
2022 · Robert Heinke, Martin Ehrhardt, et al. · Applied Surface Science · 14
Dry etching of monocrystalline silicon using a laser-induced reactive micro plasma
2021 · Robert Heinke, Martin Ehrhardt, et al. · Applied Surface Science Advances · 12
Influence of Fluence and Pulse Number on Laser Cleaning of Atmospheric‐Pressure‐Plasma‐Jet‐Etched Optical Glasses
2023 · Robert Heinke, Thomas Arnold, et al. · physica status solidi (a) · 9
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Pulse duration dependent laser-induced plasma etching of polyimide using a high repetition rate laser
2023 · Visar Demiri, Martin Ehrhardt, et al. · Applied Surface Science Advances · 5
Transfer of micron pattern with reactive atmospheric plasma jets into fused silica
2024 · Martin Ehrhardt, Pierre Lorenz, et al. · Applied Surface Science Advances · 4
Laser-cleaning of atmospheric pressure plasma jet etched Zerodur
2024 · Robert Heinke, Thomas Arnold, et al. · European Seminar on Precision Optics Manufacturing · 4
Simultaneous atmospheric pressure plasma jet etching and laser irradiation for ultra-precise optical glass processing
2024 · Robert Heinke, Thomas Arnold, et al. · EPJ Web of Conferences · 2
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Impact of the temperature on laser ablation of residues from APPJ-etched N-BK7 optical glass
2025 · Robert Heinke, Martin Ehrhardt, et al. · Applied Surface Science · 1
Laser removal of residual layers generated by atmospheric plasma jet etching of optical glass
2026 · Martin Ehrhardt, Pierre Lorenz, et al. · Procedia CIRP
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Atmospheric pressure plasma jet pattern transfer using photolithographic masks
2025 · Robert Heinke, Lukáš Šilhan, et al. · European Seminar on Precision Optics Manufacturing
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Stability of masking materials for pattern transfer of lithographic masks into fused silica by atmospheric pressure plasma jet etching
2025 · Robert Heinke, Lukáš Šilhan, et al. · Micro and Nano Engineering
Works count: 13
Citation count: 70
H-index: 5
I10-index: 3
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