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Author

Tetsu Kohyama

OpenAlex ID: A5006288746
The filter adsorption mechanism in photoresist materials
2012 · Tetsu Kohyama · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10
Targeted removal of metallic contamination from lithography solvents using membrane purifiers
2018 · Aiwen Wu, Tetsu Kohyama, et al. · Advances in Patterning Materials and Processes · 4
The intrinsic role of membrane morphology to reduce defectivity in advanced photochemicals
2018 · Tetsu Kohyama, Aiwen Wu, et al. · Advances in Patterning Materials and Processes · 3
An update on the improvement in optimization of point-of-use filtration of metal oxide photoresists
2024 · Tetsu Kohyama, Kashif Choudry, et al. · Advances in Patterning Materials and Processes · 2
Bridging the defect gap in EUV photoresist
2019 · Tetsu Kohyama, Fumiya Kaneko, et al. · Advances in Patterning Materials and Processes · 2
NTD CARs purity developments toward single-print capability in EUV scanners
2025 · Kozue Miura, Tetsu Kohyama · Advances in Patterning Materials and Processes · 1
Updated UPE filter design for point-of-use EUV CAR photoresist filtration for defect improvement
2024 · Tetsu Kohyama, Philippe Foubert · Advances in Patterning Materials and Processes · 1
Continued optimization of point-of-use filtration for metal oxide photoresists to reduce defect density
2023 · Tetsu Kohyama, Shu-Hao Chang, et al. · Advances in Patterning Materials and Processes · 1
Filter technology developments to address defectivity in leading-edge photoresists
2019 · Tetsu Kohyama, Fumiya Kaneko, et al. · Advances in Patterning Materials and Processes · 1
Development of novel purifiers with appropriate functional groups based on solvent polarities at bulk filtration
2017 · Tetsu Kohyama, Fumiya Kaneko, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
A novel purifier for acid-sensitive applications: suppressing dimerization and metal impurities in solvent system
2026 · Elmer Lin, Antonio Ramirez, et al. · Advances in Patterning Materials and Processes
Point-of-use UPE membrane filter optimization for EUV chemically amplified photoresist
2026 · Alexander Holmann, Tetsu Kohyama, et al. · Advances in Patterning Materials and Processes
Exploration of UPE membrane technology in point-of-use EUV CAR photoresist filtration
2025 · Tetsu Kohyama, Nadia Vandenbroeck, et al. · Advances in Patterning Materials and Processes
Selective contaminant removal in EUV photoresists using a tailored functionality filter
2022 · Tetsu Kohyama, Jad A. Jaber · Advances in Patterning Materials and Processes
A novel filter screening methodology for Si hardmask materials in EUV lithography
2020 · Tetsu Kohyama, Kozue Miura · Advances in Patterning Materials and Processes
Works count: 15
Citation count: 26
H-index: 3
I10-index: 1
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