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Dhairya J. Dixit
Observed names:
Dhairya Dixit,
Dixit, Dhairya J.
Institution:
GlobalFoundries (United States)
Observed institutions:
State University of New York,
GlobalFoundries (United States),
University at Albany, State University of New York,
SUNY Polytechnic Institute
ORCID:
0000-0002-3064-8524
Observed ORCID:
0000-0002-3064-8524
OpenAlex ID:
A5006529880
Sensitivity analysis and line edge roughness determination of 28-nm pitch silicon fins using Mueller matrix spectroscopic ellipsometry-based optical critical dimension metrology
2015
·
Dhairya J. Dixit
, Samuel O’Mullane
, et al.
·
Journal of Micro/Nanopatterning Materials and Metrology
·
25
PDF
Nonconventional applications of Mueller matrix-based scatterometry for advanced technology nodes
2018
·
Dhairya Dixit
, Nick Keller
, et al.
·
Journal of Micro/Nanopatterning Materials and Metrology
·
24
Optical critical dimension metrology for directed self-assembly assisted contact hole shrink
2016
·
Dhairya Dixit
, Avery Green
, et al.
·
Journal of Micro/Nanopatterning Materials and Metrology
·
21
Metrology for block copolymer directed self-assembly structures using Mueller matrix-based scatterometry
2015
·
Dhairya J. Dixit
, Vimal Kamineni
, et al.
·
Journal of Micro/Nanopatterning Materials and Metrology
·
19
Advanced applications of scatterometry based optical metrology
2017
·
Dhairya Dixit
, Nick Keller
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
15
Metrology for directed self-assembly block lithography using optical scatterometry
2014
·
Dhairya Dixit
, Vimal Kamineni
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
10
Correlation study of actual temperature profile and in-line metrology measurements for within-wafer uniformity improvement and wafer edge yield enhancement (Conference Presentation)
2018
·
Fang Fang
, Candice Porter
, et al.
·
Metrology, Inspection, and Process Control XXXVI
·
9
Spectroscopic ellipsometry studies of 3-stage deposition of CuIn1−xGaxSe2 on Mo-coated glass and stainless steel substrates
2016
·
Sravan Sunkoju
, Sandra Schujman
, et al.
·
Thin Solid Films
·
8
Mueller matrix optical scatterometry of Si fins patterned using directed self-assembly block copolymer line arrays
2014
·
Dhairya Dixit
, Manasa Medikonda
, et al.
·
ASMC proceedings
·
6
Characterization of Overlay and Tilt in Advanced Technology Nodes using Scatterometry
2019
·
Dhairya Dixit
, Sonal Dey
, et al.
·
ASMC proceedings
·
5
Advancements in Ellipsometric and Scatterometric Analysis
2016
·
Samuel O’Mullane
, Dhairya Dixit
, et al.
·
CRC Press eBooks
·
3
Optical metrology for directed self-assembly patterning using Mueller matrix spectroscopic ellipsometry based scatterometry
2015
·
Dixit, Dhairya J.
·
3
Metrology manufacturing control factors: A holistic approach for supporting 14nm and 7nm
2017
·
David Jayez
, Alok Vaid
, et al.
·
ASMC proceedings
·
1
Silicon fin line edge roughness determination and sensitivity analysis by Mueller matrix spectroscopic ellipsometry based scatterometry
2015
·
Dhairya Dixit
, Samuel O'Mullane
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Optical CD metrology for directed self-assembly assisted contact hole shrink process
2015
·
Dhairya Dixit
, Erik R. Hosler
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Metrology manufacturing control factors: A holistic approach for supporting 14nm and 7nm
2017
·
David Jayez
, Alok Vaid
, et al.
·
International Convention on Information and Communication Technology, Electronics and Microelectronics
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Works count:
16
Citation count:
151
H-index:
8
I10-index:
6
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