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Author

Yohei Kotsugi

Observed name: Kotsugi, Yohei
ORCID: 0000-0003-3111-4185
Observed ORCID: 0000-0003-3111-4185
OpenAlex ID: A5007295983
Atomic Layer Deposition of Ru for Replacing Cu-Interconnects
2021 · Yohei Kotsugi, Seung-Min Han, et al. · Chemistry of Materials · 81
Atomic Layer Deposited RuO2 Diffusion Barrier for Next Generation Ru‐Interconnects
2022 · Youn‐Hye Kim, Minsu Kim, et al. · Advanced Functional Materials · 36
Self‐Formation of a Ru/ZnO Multifunctional Bilayer for the Next‐Generation Interconnect Technology via Area‐Selective Atomic Layer Deposition
2023 · Yuki Mori, Taehoon Cheon, et al. · Small · 24
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Development of RuS 2 for near‐infrared photodetector by atomic layer deposition and post‐sulfurization
2022 · Tatsuya Nakazawa, Donghyun Kim, et al. · Rare Metals · 11
Quantitative Two-Stage Classification of Gas Mixtures Using 2-D TMDC and PGM Chalcogenides
2022 · Inkyu Sohn, Joungbin An, et al. · IEEE Sensors Journal · 7
Deposition of Ru using a metal organic Ru precursor and H2 molecules as a non-oxidative reactant for emerging Ru interconnects
2025 · Yohei Kotsugi, Yohei Uchiyama, et al. · IEEE International Interconnect Technology Conference (IITC) · 2
Metallic nanofilms on Si(100) and SiO2 grown with a ruthenium precursor
2024 · Leonid Bolotov, Yohei Kotsugi, et al. · Japanese Journal of Applied Physics · 1
Atomic layer deposition of RuO2using a new metalorganic precursor as a diffusion barrier for Ru interconnect
2021 · Youn-Hye Kim, Yohei Kotsugi, et al. · IEEE International Interconnect Technology Conference (IITC) · 1
Supplemental online materials
2026 · Bolotov, Leonid, Kotsugi, Yohei, et al. · AIP Publishing
Temperature and Reactant-Driven Growth Pathways of Ruthenium Nanofilms on H-Terminated Si(100): Insights from Nanoscale Characterization and Machine Learning
2026 · Uchida, Noriyuki, Kotsugi, Yohei, et al. · AIP Publishing
Temperature and reactant-driven growth pathways of ruthenium nanofilms on H-terminated Si(100): Insights from nanoscale characterization and machine learning
2026 · Leonid Bolotov, Yohei Kotsugi, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
Fabrication of a 940 nm RuS2 Photodetector via Post-Sulfurization of Ru Thin Film Grown by Atomic Layer Deposition
2024 · Jaehyeok Kim, Tatsuya Nakazawa, et al. · International Conference on Sensing Technology
The Formation of Ru/ZnO Multifunctional Bilayer through Area Selective Atomic Layer Deposition for Advanced Cu Metallization
2023 · Yuki Mori, Taehoon Cheon, et al. · IEEE International Interconnect Technology Conference and IEEE Materials for Advanced Metallization Conference (IITC/MAM)
Works count: 13
Citation count: 163
H-index: 5
I10-index: 4
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