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Tai‐Chen Kuo

Observed names: T. F. Kuo, Tai Chen Kuo, Tai-Chen Kuo
ORCID: 0000-0003-0270-5461
Observed ORCID: 0000-0003-0270-5461
OpenAlex ID: A5008058715
Effect of microwave annealing on electrical characteristics of TiN/Al/TiN/HfO2/Si MOS capacitors
2017 · Tzu-Lang Shih, Yin-Hsien Su, et al. · Applied Physics Letters · 20
Synthesis and tunable luminescence properties of SrY₂O₄:Dy³⁺ phosphors
2024 · Yee-Shin Chang, Cheng-Xin You, et al. · Ceramics International · 17
A study on the plating and wetting ability of ruthenium-tungsten multi-layers for advanced Cu metallization
2016 · Tai-Chen Kuo, Yin-Hsien Su, et al. · Microelectronic Engineering · 11
Effect of tungsten incorporation in cobalt tungsten alloys as seedless diffusion barrier materials
2017 · Yin-Hsien Su, Tai-Chen Kuo, et al. · Microelectronic Engineering · 8
Neutral beam and ICP etching of HKMG MOS capacitors: Observations and a plasma-induced damage model
2017 · Tai-Chen Kuo, Tzu-Lang Shih, et al. · Journal of Applied Physics · 6
Exploring the influence of La3+ ion substitution and Zn2+ doping on structural, luminescent, and morphological properties of SrY2O4:Dy3+
2025 · Yee-Shin Chang, Tai-Chen Kuo · Ceramics International · 4
Effect of annealing conditions on dopants activation and stress conservation in silicon-germanium
2019 · Tai-Chen Kuo, Kai-Jyun Jhong, et al. · AIP Advances · 3
Investigation the plating and wetting ability of reactive sputtered Molybdenum-Tungsten multi-layers for advanced Cu metallization
2016 · Tai-Chen Kuo, Tzu-Lang Shih, et al. · IEEE International Conference on Nanotechnology (IEEE-NANO) · 3
Investigating the effects of etching systems and low-temperature thermal processing on hafnium zirconium oxide thin film properties
2024 · Wen-Hsi Lee, Edward Kuo, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2
Exploration of High‐Pressure Annealing and Microwave Annealing in Palladium Germano‐Silicide Formation for Si0.8Ge0.2‐Based Complementary Metal‐Oxide–Semiconductor Transistors
2024 · Tai‐Chen Kuo, Michael Ira Current · Advanced Engineering Materials · 1
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Investigation of high-k/metal gate MOS capacitors annealed by microwave annealing as a post-metal annealing process
2016 · Yin-Hsien Su, Tai-Chen Kuo, et al. · IEEE International Conference on Nanotechnology (IEEE-NANO) · 1
A new and simple experimental approach to characterizing the carrier transport and reliability of strained CMOS devices in the quasi-ballistic regime
2009 · E. R. Hsieh, Steve S. Chung, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 1
Dopant and thermal interaction on SPE formed SiC for NMOS performance enhancement
2009 · P. W. Liu, T. F. Kuo, et al. · International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA) · 1
Simulation-Assisted Deep Reinforcement Learning for Lens Assembly Optimization in Free-Space Optical Transceiver Modules
2026 · Chen-Fang Kang, Chih-Chang Hung, et al. · Photonics
Defect Repair and Dopant Activation in Boron‐Implanted Germanium Through Integrated Microwave and Supercritical Fluid Treatment
2026 · Dung‐Sheng Tsai, Ting‐Chang Chang, et al. · Advanced Engineering Materials
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Phase evolution and photoluminescence tuning of Dy3+ activated NaAlGeO4 phosphors through K+ substitution
2026 · Yee-Shin Chang, Guo-Ju Chen, et al. · Ceramics International
Defect-state and electronic-structure modulation of β-Ga2O3 thin films via Zn/N Co-doping toward deep-ultraviolet optoelectronic materials
2026 · Shih-Syun Chen, Wen-Hsi Lee, et al. · Materials Science in Semiconductor Processing
Effect of Dy3+ concentration on the phase structure and photoluminescence of NaAlGeO4 phosphors
2026 · Yee-Shin Chang, Sean Wu, et al. · Ceramics International
Investigate P-Type Conductivity in Ga2O3 Thin Films via Sputtering by Varying Zinc and Nitrogen Ratios and Post-Annealing Temperatures
2025 · Tai-Chen Kuo, Wen-Hsi Lee · IEEE International Conference in Power Engineering Applications (ICPEA)
Study on the fabrication of high-quality hafnium oxide thin films using spatial rotated atomic layer deposition and supercritical fluids treatment
2024 · Wen-Hsi Lee, Chien-Ching Feng, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
Investigation of the activation and diffusion of ion-implanted p-type and n-type dopants in germanium using high-pressure annealing
2024 · Tai Chen Kuo, Wen-Hsi Lee, et al. · Japanese Journal of Applied Physics
Effect of Two-Step Ion Implantation and Microwave Annealing on Dopants Activation in Silicon-Germanium
2019 · Tai‐Chen Kuo, Chao-Yi Lin, et al. · Journal of Material Science & Engineering
High Dopant Activation of Boron in SiGe with two-step Implantation and Microwave Annealing
2018 · Tai-Chen Kuo, Chao-Yi Lin, et al. · International Conference on Ion Implantation Technology
A study on the plating and wetting ability of ruthenium-tungsten multi-layers for advanced Cu metallization
2016 · Tai-Chen Kuo, Yin-Hsien Su, et al. · IEEE International Interconnect Technology Conference (IITC)
Design of high-performance and highly reliable nMOSFETs with embedded Si:C S/D extension stressor(Si:C S/D-E)
2006 · Steve S. Chung, E. R. Hsieh, et al. · Symposium on VLSI Technology
Works count: 25
Citation count: 78
H-index: 5
I10-index: 3
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