Get started
Author

Gerardo Bottiglieri

Observed name: G. Bottiglieri
Institution: ASML (Netherlands)
ORCID: 0000-0001-5851-2445
Observed ORCID: 0000-0001-5851-2445
OpenAlex ID: A5010126078
High NA EUV lithography: Next step in EUV imaging
2019 · Eelco van Setten, Gerardo Bottiglieri, et al. · Extreme Ultraviolet (EUV) Lithography · 68
3D mask effects in high NA EUV imaging
2019 · Andreas Erdmann, Peter Evanschitzky, et al. · Extreme Ultraviolet (EUV) Lithography · 31
Edge placement error control and Mask3D effects in High-NA anamorphic EUV lithography
2017 · Eelco van Setten, Gerardo Bottiglieri, et al. · International Conference on Extreme Ultraviolet Lithography · 29
Investigation of waveguide modes in EUV mask absorbers
2021 · Hazem M. S. Mesilhy, Peter Evanschitzky, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 21
PDF
EUV High-NA scanner and mask optimization for sub 8 nm resolution
2015 · Jan van Schoot, Koen van Ingen Schenau, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 19
Imaging performance of the EUV high NA anamorphic system
2015 · Koen van Ingen Schenau, Gerardo Bottiglieri, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 17
High-NA EUV imaging: challenges and outlook
2019 · Bartosz Bilski, Joerg Zimmermann, et al. · European Mask and Lithography Conference (EMLC) · 15
Multilayer optimization for high-NA EUV mask3D suppression
2020 · Eelco van Setten, Katrina Rook, et al. · 13
Pathfinding the perfect EUV mask: the role of the multilayer
2020 · Hazem M. S. Mesilhy, Peter Evanschitzky, et al. · SPIE Conference on Extreme Ultraviolet (EUV) Lithography · 13
EUV high-NA scanner and mask optimization for sub-8nm resolution
2016 · Jan van Schoot, Koen van Ingen Schenau, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11
Advancing semiconductor patterning with EUV hyper NA: opportunities and challenges
2025 · Gerardo Bottiglieri, Pieter Woltgens, et al. · SPIE Optical and EUV Nanolithography · 9
Lithographic effects due to particles on high-NA EUV mask pellicle
2019 · Lokesh Devaraj, Gerardo Bottiglieri, et al. · European Mask and Lithography Conference (EMLC) · 8
Anamorphic imaging at high-NA EUV: mask error factor and interaction between demagnification and lithographic metrics
2016 · Gerardo Bottiglieri, Thorsten Last, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
EUV mask absorber induced best focus shifts
2022 · Hazem Mesilhy, Peter Evanschitzky, et al. · SPIE Optical and EUV Nanolithography · 6
Pathfinding the perfect EUV mask: understanding the EUV mask using the hybrid mask model
2021 · Hazem M. S. Mesilhy, Peter Evanschitzky, et al. · International Conference on Extreme Ultraviolet Lithography · 6
High-NA EUV imaging: from system introduction towards low-k1 extension
2021 · Eelco van Setten, Jan van Schoot, et al. · International Conference on Extreme Ultraviolet Lithography · 5
EUV dark field lithography: extreme resolution by blocking 0th order
2021 · Timothy A. Brunner, Jara G. SantaClara, et al. · Extreme Ultraviolet (EUV) Lithography · 5
In-line Small-Spot X-Ray Fluorescence Assessment of Electroplating and Chemical Mechanical Polishing
2006 · J.-P. Gueneau de Mussy, G. Bottiglieri, et al. · Journal of The Electrochemical Society · 4
PDF
Resolution enhancement for high-numerical aperture extreme ultraviolet lithography by split pupil exposures: a modeling perspective
2024 · Andreas Erdmann, Hazem Mesilhy, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 3
Particle on EUV pellicles, impact on LWR
2019 · Michiel Kupers, Gijsbert Rispens, et al. · International Conference on Extreme Ultraviolet Lithography · 3
High NA EUV has arrived, what are the upcoming challenges?
2025 · Jan van Schoot, Eelco van Setten, et al. · International Conference on Extreme Ultraviolet Lithography · 2
Exploring the limits of high contrast contact imaging using split pupil exposures in high-NA EUV lithography
2024 · Andreas Erdmann, Hazem Mesilhy, et al. · SPIE Optical and EUV Nanolithography · 2
Investigation of waveguide modes in EUV mask absorbers
2021 · Hazem Mesilhy, Peter Evanschitzky, et al. · Extreme Ultraviolet (EUV) Lithography · 2
Hyper-NA: a tool with a numerical aperture (NA) of at least 0.75
2025 · Michael Patra, Heiko Feldmann, et al. · International Conference on Extreme Ultraviolet Lithography · 1
Advancing semiconductor patterning with EUV hyper NA: opportunities and challenges
2025 · Gerardo Bottiglieri, Pieter Woltgens, et al. · European Mask and Lithography Conference (EMLC) · 1
Works count: 40
Citation count: 306
H-index: 10
I10-index: 10
Year
Topic
Type