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L. Gatilova

Observed names: Gatilova Lina, Gatilova, L, Gatilova, L., Gatilova, Lina, L Gatilova, L V Gatilova, L. V. Gatilova, Lina Gatilova, Lina V. Gatilova, Lina, Gatilova, Л В Гатилова, Л. В. Гатилова
Observed institutions: Centre National de la Recherche Scientifique, École Polytechnique, St Petersburg University, Université Paris Sciences et Lettres, Université Paris-Saclay, Observatoire de Paris, Sorbonne Université, Centre de Nanosciences et de Nanotechnologies, Laboratoire d’Etudes du Rayonnement et de la Matière en Astrophysique et Atmosphères, Laboratoire Photonique, Numérique et Nanosciences, Laboratoire de Physique des Plasmas, Université de Cergy-Pontoise, LIRA - Laboratoire d'instrumentation et de recherche en astrophysique, Université Pierre-et-Marie-Curie
ORCID: 0000-0002-4879-4917
Observed ORCID: 0000-0002-4879-4917
OpenAlex ID: A5012637891
A 520–620-GHz Schottky Receiver Front-End for Planetary Science and Remote Sensing With 1070 K–1500 K DSB Noise Temperature at Room Temperature
2015 · J. Treuttel, L. Gatilova, et al. · IEEE Transactions on Terahertz Science and Technology · 102
On NOxproduction and volatile organic compound removal in a pulsed microwave discharge in air
2005 · A Rousseau, A Dantier, et al. · Plasma Sources Science and Technology · 65
Sidewall passivation assisted by a silicon coverplate during Cl2–H2 and HBr inductively coupled plasma etching of InP for photonic devices
2008 · S. Bouchoule, G. Patriarche, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 47
Time-resolved study of a pulsed dc discharge using quantum cascade laser absorption spectroscopy: NO and gas temperature kinetics
2007 · S Welzel, L Gatilova, et al. · Plasma Sources Science and Technology · 44
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Surface loss rates of H and Cl radicals in an inductively coupled plasma etcher derived from time-resolved electron density and optical emission measurements
2010 · G. A. Curley, L. Gatilova, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 40
NO formation mechanisms studied by infrared laser absorption in a single low-pressure plasma pulse
2007 · L V Gatilova, K Allegraud, et al. · Plasma Sources Science and Technology · 39
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Energy harvesting efficiency in GaN nanowire-based nanogenerators: the critical influence of the Schottky nanocontact
2017 · Nicolas Jamond, Pascal Chrétien, et al. · Nanoscale · 37
Photocatalyst activation in a pulsed low pressure discharge
2005 · A. Rousseau, O. Guaitella, et al. · Applied Physics Letters · 36
Diagnostic studies of molecular plasmas using mid-infrared semiconductor lasers
2008 · J. Röpcke, S. Welzel, et al. · Applied Physics B · 31
Combination of a pulsed microwave plasma with a catalyst for acetylene oxidation
2004 · A. Rousseau, O. Guaitella, et al. · Applied Physics Letters · 31
Investigation of InP etching mechanisms in a Cl2/H2 inductively coupled plasma by optical emission spectroscopy
2009 · L. Gatilova, S. Bouchoule, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 28
Plasma-photocatalyst interaction: Production of oxygen atoms in a low pressure discharge
2005 · O. Guaitella, L. Gatilova, et al. · Applied Physics Letters · 28
High Efficiency and Wideband 300 GHz Frequency Doubler Based on Six Schottky Diodes
2017 · Jiangqiao Ding, Alain Maestrini, et al. · Journal of Infrared Millimeter and Terahertz Waves · 25
NO and NO2 production in pulsed low pressure dc discharge
2005 · Antoine Rousseau, Lina V. Gatilova, et al. · Applied Physics Letters · 20
1200 GHz High Spectral Resolution Receiver Front-End of Submillimeter Wave Instrument for JUpiter ICy Moon Explorer: Part I - RF Performance Optimization for Cryogenic Operation
2023 · Jeanne Treuttel, Lina Gatilova, et al. · IEEE Transactions on Terahertz Science and Technology · 19
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The 1200GHz Receiver Frontend of the Submillimetre Wave Instrument of ESA JUpiter ICy moons Explorer
2018 · A. Maestrini, L. Gatilova, et al. · International Conference on Infrared, Millimeter, and Terahertz Waves (IRMMW-THz) · 19
Monte Carlo Study of 2-D Capacitance Fringing Effects in GaAs Planar Schottky Diodes
2016 · Diego Moro-Melgar, Alain Maestrini, et al. · IEEE Transactions on Electron Devices · 19
Global Model of $\hbox{Cl}_{2}\hbox{/Ar}$ High-Density Plasma Discharge and 2-D Monte-Carlo Etching Model of InP
2012 · R. Chanson, A. Rhallabi, et al. · IEEE Transactions on Plasma Science · 19
A 330 GHz frequency doubler using European MMIC Schottky process based on e-beam lithography
2014 · J. Treuttel, L. Gatilova, et al. · URSI General Assembly and Scientific Symposium · 16
A 300 GHz power‐combined frequency doubler based on E‐plane 90°‐hybrid and Y‐junction
2019 · Jiang‐Qiao Ding, Alain Maestrini, et al. · Microwave and Optical Technology Letters · 13
Terahertz Schottky Mixers for Atmospheric and Planetary Sciences
2019 · A. Maestrini, G. Gay, et al. · International Conference on Infrared, Millimeter, and Terahertz Waves (IRMMW-THz) · 7
Recent progress in the Development of French THz Schottky Diodes for Astrophysics, Planetology and Atmospheric Study
2019 · L. Gatilova, S. Caroopen, et al. · International Conference on Infrared, Millimeter, and Terahertz Waves (IRMMW-THz) · 7
Measurement of the C2H2destruction kinetics by infrared laser absorption spectroscopy in a pulsed low pressure dc discharge
2007 · A Rousseau, O Guaitella, et al. · Journal of Physics D Applied Physics · 7
Addition of Si-Containing Gases for Anisotropic Etching of III–V Materials in Chlorine-Based Inductively Coupled Plasma
2011 · Lina Gatilova, Sophie Bouchoule, et al. · Japanese Journal of Applied Physics · 6
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High-aspect-ratio inductively coupled plasma etching of InP using SiH4/Cl2: Avoiding the effect of electrode coverplate material
2011 · L. Gatilova, S. Bouchoule, et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 6
Works count: 62
Citation count: 733
H-index: 18
I10-index: 20
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