Get started
Author

Min Young Yoon

Observed names: M Y Yoon, M. Yoon, M.Y. Yoon, Min-Young Yoon
ORCID: 0000-0002-8048-5057
Observed ORCID: 0000-0002-8048-5057
OpenAlex ID: A5014223471
Discharge physics and atomic layer etching in Ar/C4F6 inductively coupled plasmas with a radio frequency bias
2021 · Min Young Yoon, H. J. Yeom, et al. · Physics of Plasmas · 71
Plasma etching of the trench pattern with high aspect ratio mask under ion tilting
2022 · Min Young Yoon, H.J. Yeom, et al. · Applied Surface Science · 64
Flat cutoff probe for real-time electron density measurement in industrial plasma processing
2019 · H J Yeom, J H Kim, et al. · Plasma Sources Science and Technology · 53
PDF
Role of Oxygen in Amorphous Carbon Hard Mask Plasma Etching
2023 · Hee-Jung Yeom, Min Young Yoon, et al. · ACS Omega · 21
PDF
Plasma low-energy ion flux induced vertical graphene synthesis
2023 · Min Young Yoon, Jong-Ryul Jeong, et al. · Applied Surface Science · 18
Low‐Temperature, Universal Synthetic Route for Mesoporous Metal Oxides by Exploiting Synergistic Effect of Thermal Activation and Plasma
2024 · Keon‐Woo Kim, Hyunho Seok, et al. · Advanced Materials · 17
Real-time monitoring of the plasma density distribution in low-pressure plasmas using a flat-cutoff array sensor
2023 · H. J. Yeom, Min Young Yoon, et al. · Applied Physics Letters · 16
PDF
Evaluation of H2 Plasma‐Induced Damage in Materials for EUV Lithography
2023 · Eun‐Seok Choe, Seungwook Choi, et al. · Advanced Materials Interfaces · 11
PDF
Effect of SiH4 fragments and H radicals on nc-Si:H film deposition in an inductively coupled plasma PECVD
2025 · Min Young Yoon, Hee-Jung Yeom, et al. · Surfaces and Interfaces · 10
Temperature‐Dependent Phase Transition in WS2 for Reinforcing Band‐to‐Band Tunneling and Photoreactive Random Access Memory Application
2023 · Gunhoo Woo, Jinill Cho, et al. · Small Science · 6
PDF
Development of a flat cutoff probe covered with a dielectric layer for non-invasive plasma diagnostics
2024 · Gwang-Seok Chae, Hee-Jung Yeom, et al. · Plasma Sources Science and Technology · 5
Effect of radiofrequency bias power on transmission spectrum of flat-cutoff sensor in inductively coupled plasma
2024 · Hee-Jung Yeom, Gwang-Seok Chae, et al. · Physics of Plasmas · 5
Control of silver nanoparticle size and shape in RF-biased inductively coupled plasma systems
2025 · Jin-Hoo Seong, Min Young Yoon, et al. · Surfaces and Interfaces · 4
Brief Review of Atomic Layer Etching Based on Radiofrequency-Biased Ar/C4F6-Mixture-Based Inductively Coupled Plasma Characteristics
2023 · Min Young Yoon, Hee Jung Yeom, et al. · Applied Science and Convergence Technology · 4
PDF
Numerical investigation of plasma properties in Ar/SiH4 inductively coupled plasmas considering electron energy distribution functions
2024 · Ji-Hoon Kim, Min-Young Yoon, et al. · Journal of Applied Physics · 3
PDF
Parametric Analysis of Substrate Heating in Low-Pressure Inductively Coupled Plasma
2025 · Jin-Hoo Seong, Hee-Jung Yeom, et al. · Applied Science and Convergence Technology · 2
PDF
Low‐Temperature, Universal Synthetic Route for Mesoporous Metal Oxides by Exploiting Synergistic Effect of Thermal Activation and Plasma (Adv. Mater. 18/2024)
2024 · Keon‐Woo Kim, Hyunho Seok, et al. · Advanced Materials · 1
PDF
Temperature‐Dependent Phase Transition in WS2 for Reinforcing Band‐to‐Band Tunneling and Photoreactive Random Access Memory Application
2024 · Gunhoo Woo, Jinill Cho, et al. · Small Science · 1
Low Damage In-Situ Contact Cleaning Method by a Highly Dense and Directional ECR Plasma
1995 · I. S. Park, M. Yoon, et al. · International Conference on Solid State Devices and Materials (SSDM) · 1
Re-deposition and etching characteristics of plasma-exposed ceramics for semiconductor etching equipment
2026 · Seong-Hyeon Kim, Min Young Yoon, et al. · Vacuum
PDF
Effects of transport loss on quadrupole mass spectrometer measurements in nitrogen plasmas
2026 · Min Young Yoon, Sijun Kim, et al. · Vacuum
Effect of magnetic-field orientation on electron-density measurement using microwave cutoff probes in weakly magnetized plasma
2026 · Jae-Heon Lee, Do-Yeon Hwang, et al. · Journal of Applied Physics
Evolution of the electron energy probability function in Ar/SiH4 inductively coupled plasma
2026 · Seong-Hyeon Kim, Hee-Jung Yeom, et al. · Applied Physics Letters
Effect of Substrate Temperature on the Deposition Characteristics of Hydrogenated Nanocrystalline Silicon Thin Film in Plasma-Enhanced Chemical Vapor Deposition Process
2026 · Min Young Yoon, Hee-Jung Yeom, et al. · Applied Science and Convergence Technology
PDF
Development of a Wafer-Embeddable Microwave Patch Antenna Sensor for Plasma Diagnostics in Semiconductor Processing
2026 · Gwang-Seok Chae, Hee-Jung Yeom, et al. · IEEE Transactions on Instrumentation and Measurement
Works count: 33
Citation count: 313
H-index: 9
I10-index: 9
Year
Topic
Type