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Da-Yuan Lee

Post-soft-breakdown characteristics of deep submicron NMOSFETs with ultrathin gate oxide
2001 · Min-Yu Tsai, Horng-Chih Lin, et al. · IEEE Electron Device Letters · 11
Breakdown Modes and Their Evolution in Ultrathin Gate Oxide
2002 · Horng-Chih Lin, Da-Yuan Lee, et al. · Japanese Journal of Applied Physics · 10
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Process and doping species dependence of negative-bias-temperature instability for P-channel MOSFETs
2003 · Da-Yuan Lee, Horng-Chih Lin, et al. · International Symposium on Plasma Process-Induced Damage · 6
Effects of Process and Gate Doping Species on Negative- Bias-Temperature Instability of p-Channel MOSFETs
2004 · Da-Yuan Lee, Tiao-Yuan Huang, et al. · Journal of The Electrochemical Society · 5
Anomalous Gate-Edge Leakage Induced by High Tensile Stress in NMOSFET
2008 · Po-Tsun Liu, Chen-Shuo Huang, et al. · IEEE Electron Device Letters · 3
Impacts of HF etching on ultra-thin core gate oxide integrity in dual gate oxide CMOS technology
2003 · Da-Yuan Lee, Horng-Chih Lin, et al. · International Symposium on Plasma Process-Induced Damage · 3
Enhanced Negative-Bias-Temperature Instability of P-Channel Metal-Oxide-Semiconductor Transistors due to Plasma Charging Damage
2002 · Da-Yuan Lee, Horng-Chih Lin, et al. · Japanese Journal of Applied Physics · 3
Tilt angle effect on DC and AC performance of Halo PMOS
1996 · Jlong-Guang Su, Shyh-Chyl Wong, et al. · Journal of Technology Computer Aided Design TCAD · 2
New Mechanism for Negative-Bias-Temperature Instability and Its Impact on Scaling of pMOSFETs
2003 · Da-Yuan Lee, Horng-Chih Lin, et al. · International Conference on Solid State Devices and Materials (SSDM) · 1
Enhanced Negative-Bias-Temperature Instability of P-Channel MOSFET by Plasma Charging Damage
2001 · Da-Yuan Lee, Horng-Chih. Lin, et al. · International Conference on Solid State Devices and Materials (SSDM) · 1
Novel Silicon Surface Pre-Treatment (SSPT) Technique for CMOS Device Performance Boosting
2008 · Da-Yuan Lee, C.C. Chen, et al. · IEEE International Power Modulator Symposium and High-Voltage Workshop (IPMHVC)
Nitrogen-related enhanced reliability degradation in nMOSFETs with 1.6 nm gate dielectric
2003 · Ching-Wei Chen, Chao-Hsin Chien, et al. · International Workshop on Gate Insulator (IWGI)
Negative-Bias-Temperature Instability in Ultra Thin Nitride/Oxide Stack Gate Dielectric
2002 · Da-Yuan Lee, Horng-Chih. Lin, et al. · International Conference on Solid State Devices and Materials (SSDM)
Effects of Fluorine Incorporation on the Negative-Bias-Temperature Instability (NBTI) of P-Channel MOSFETs
2002 · Wan-Ju Chiang, Da-Yuan Lee, et al. · SIAM International Conference on Data Mining
Post-Soft-Breakdown Characteristics of Deep Sub-Micron NMOSFETs with Ultra-Thin Gate Oxide
2001 · Da-Yuan Lee, Horng-Chih Lin, et al. · International Conference on Solid State Devices and Materials (SSDM)
Works count: 15
Citation count: 45
H-index: 4
I10-index: 2
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