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N. Schubert

Observed names: Nils Schubert, Schubert, Nils
ORCID: 0009-0001-2661-8218
Observed ORCID: 0009-0001-2661-8218
OpenAlex ID: A5016365646
The mechanism of anodic dissolution of cobalt in neutral and alkaline electrolyte at high current density
2013 · N. Schubert, M. Schneider, et al. · Electrochimica Acta · 42
Electrochemical machining of hard metals – WC/Co as example
2013 · M. M. Lohrengel, K. P. Rataj, et al. · Powder Metallurgy · 40
Electrochemical Machining of cemented carbides
2014 · N. Schubert, M. Schneider, et al. · International Journal of Refractory Metals and Hard Materials · 39
In-situ investigation of the interplay between microstructure and anodic copper dissolution under near-ECM conditions – Part 1: The active state
2011 · M. Schneider, S. Schroth, et al. · Electrochimica Acta · 34
Anodic dissolution behaviour and surface texture development of cobalt under electrochemical machining conditions
2013 · M. Schneider, N. Schubert, et al. · Electrochimica Acta · 31
In-situ investigation of the interplay between microstructure and anodic copper dissolution under near-ECM conditions—Part 2: The transpassive state
2012 · M. Schneider, S. Schroth, et al. · Electrochimica Acta · 28
Electrochemical machining of tungsten carbide
2017 · N. Schubert, M. Schneider, et al. · Journal of Solid State Electrochemistry · 25
In‐situ investigation of the surface‐topography during anodic dissolution of copper under near‐ECM conditions
2010 · M. Schneider, S. Schroth, et al. · Materials and Corrosion · 21
Aqueous HF-(HCl)-Cl 2 Mixtures for Saw-Damage Removal and Spray Texturing of Monocrystalline Silicon Solar Cells
2024 · André Stapf, Niklas Zomack, et al. · IEEE Journal of Photovoltaics · 11
Electrochemical machining of a solid-state sintered ceramic – A parameter study
2017 · M. Schneider, E. Safonow, et al. · International Journal of Refractory Metals and Hard Materials · 10
Investigations on the dissolution behavior of silicon in aqueous HF-HClO 4 -mixtures
2025 · Ann-Lucia Neumann, André Stapf, et al. · RSC Advances · 9
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Wet‐Chemical Etching of Silicon Wafer Surfaces Using Aqueous HF‐HBrO 3 and HF‐HBrO 3 ‐Br 2 Solutions
2025 · Nils Schubert, Niklas Zomack, et al. · Advanced Materials Interfaces · 7
Anodic dissolution of cobalt in aqueous sodium nitrate solution at high current densities
2014 · M. Schneider, N. Schubert, et al. · Materials and Corrosion · 6
Analysis of silicon surfaces etched in aqueous HF-(HBr)–Br2-mixtures
2024 · Nils Schubert, André Stapf, et al. · Chemistry of Inorganic Materials · 5
Anodic dissolution of solid‐state sintered silicon carbide at high current densities
2016 · M. Schneider, N. Schubert, et al. · Materials and Corrosion · 5
Copper Catalyzed Anisotropic Dissolution of Silicon in HF–HCl Solutions: Metal‐Assisted Chemical Etching Without Additional Oxidant
2026 · Florian Honeit, Charleen Thiele, et al. · European Journal of Inorganic Chemistry · 4
Aqueous HF–HBrO 4 solutions for wet-chemical etching of (100) silicon wafer surfaces
2026 · Nils Schubert, Niklas Zomack, et al. · Materials Advances · 3
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The Dissolution Behavior of Silicon in Aqueous HF-(HCl)-HClO3-Mixtures: Reactivity Studies, Analytics of Etching Solutions and Surface Morphologies
2026 · Edwin Kroke, Ann-Lucia Neumann, et al. · SSRN Electronic Journal · 1
The dissolution behavior of silicon in aqueous HF-(HCl)-HClO3-mixtures: reactivity studies, analytics of etching solutions and surface morphologies
2026 · Ann-Lucia Neumann, Nils Schubert, et al. · Applied Surface Science
Author response for "Mechanistic insights into the acidic wet-chemical silicon etching in HF-HX-X 2 solutions, X = Cl, Br, I"
2026 · Nils Schubert, Niklas Zomack, et al.
Author response for "Aqueous HF-HBrO 4 Solutions for Wet-Chemical Etching of (100) Silicon Wafer Surfaces"
2026 · Nils Schubert, Niklas Zomack, et al.
Mechanistic insights into the acidic wet-chemical silicon etching in HF–HX–X 2 solutions, X = Cl, Br, I
2026 · Nils Schubert, Niklas Zomack, et al. · RSC Advances
Author response for "Investigations on the dissolution behavior of silicon in aqueous HF-HClO4-mixtures"
2025 · Ann-Lucia Neumann, André Stapf, et al.
Electrochemical machining (ECM) of titanium in an ionic liquid; Elektrochemische Bearbeitung (ECM) von Titan in einer ionischen Fluessigkeit
2013 · M. Schneider, S. Schroth, et al. · Galvanotechnik
Materials and Corrosion 2/2012
2012 · M. Schneider, S. Schroth, et al. · Materials and Corrosion
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Works count: 29
Citation count: 321
H-index: 10
I10-index: 10
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