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Andre van Dijk
Observed names:
A. Van Dijk,
A. van Dijk,
Andre Van Dijk
Observed institutions:
ASML (United States),
ASM International (Belgium),
ASML (Netherlands)
OpenAlex ID:
A5017553019
The use of EUV lithography to produce demonstration devices
2008
·
Bruno LaFontaine
, Yunfei Deng
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
42
EUVL system: moving towards production
2009
·
Hans Meiling
, Nico Buzing
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
29
PDF
Performance of the full field EUV systems
2008
·
Hans Meiling
, Edwin Boon
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
19
Imaging performance of the EUV alpha semo tool at IMEC
2008
·
G. F. Lorusso
, J. Hermans
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
16
Demonstration of scaled 0.099µm2 FinFET 6T-SRAM cell using full-field EUV lithography for (Sub-)22nm node single-patterning technology
2009
·
A. Veloso
, S. Demuynck
, et al.
·
Technical digest - International Electron Devices Meeting/Technical digest
·
15
Stability and imaging of the ASML EUV alpha demo tool
2009
·
Jan V. Hermans
, Bart Baudemprez
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
12
Full-field EUV and immersion lithography integration in 0.186μm2 FinFET 6T-SRAM cell
2008
·
A. Veloso
, S. Demuynck
, et al.
·
Technical digest - International Electron Devices Meeting/Technical digest
·
9
Validation of imaging benefits of dual monopole exposures
2023
·
Timothy A. Brunner
, Joern-Holger Franke
, et al.
·
International Conference on Extreme Ultraviolet Lithography
·
8
Tomorrow’s pitches on today’s 0.33 NA scanner: pupil and imaging conditions to print P24 L/S and P28 contact holes
2020
·
Joern-Holger Franke
, Natalia V. Davydova
, et al.
·
8
Understanding of Out-of-Band DUV light in EUV lithography: controlling impact on imaging and mitigation strategies
2015
·
N. Davydova
, R. Kottumakulal
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
8
Overlay progress in EUV lithography towards adoption for manufacturing
2011
·
Jan V. Hermans
, David Laidler
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
5
EUVL: towards implementation in production
2009
·
Hans Meiling
, Nico Buzing
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
5
Topography effects on high-NA EUV
2025
·
Nicole Guzman
, Bojja Aditya Reddy
, et al.
·
Advances in Patterning Materials and Processes
EUV exposure tool stability at IMEC (Conference Presentation)
2017
·
Vinayan Menon
, Raul Pecharroman-Gallego
, et al.
·
International Conference on Extreme Ultraviolet Lithography
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Works count:
14
Citation count:
176
H-index:
8
I10-index:
6
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