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Harim Oh

Observed name: Oh, Harim
Observed institution: Samsung Electronics (South Korea)
OpenAlex ID: A5018539995
Improvement of local CDU by using low speckle imaging
2022 · Hyounghwa Jin, Yongwoo Kim, et al. · SPIE Optical and EUV Nanolithography · 1
Analysis of pattern-dependent variation transfer in dry and wet metal oxide resist processes for EUV lithography
2026 · Ahram Suh, Harim Oh, et al. · International Conference on Extreme Ultraviolet Lithography
Optimization method of optical proximity correction for mitigation of H-V CD bias and local CD variation in DRAM hexagonal array features induced by mask 3D and curved slit at EUV lithography
2026 · Harim Oh, Ahram Suh, et al. · International Conference on Extreme Ultraviolet Lithography
Benchmarking Vision-Language Models for Automated Pathology Diagnosis and Report Generation
2026 · Lee, Yumi, Oh, Harim, et al. · arXiv (Cornell University)
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Improvement of CD uniformity using a new selective exposure focusing method
2023 · Seonho Lee, Jaewoong Sohn, et al. · SPIE Optical and EUV Nanolithography
Works count: 5
Citation count: 1
H-index: 1
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