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Author

Raoul Kirner

Observed names: Kirner, Raoul, R. Kirner
OpenAlex ID: A5018863192
Parallelized chromatic confocal sensor systems
2013 · Matthias Hillenbrand, Adrian Grewe, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 17
Mask-aligner lithography using a continuous-wave diode laser frequency-quadrupled to 193 nm
2018 · Raoul Kirner, Andreas Vetter, et al. · Optics Express · 16
Speckle orientation in paraxial optical systems
2012 · Dayan Li, Damien P. Kelly, et al. · Applied Optics · 15
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Printing sub-micron structures using Talbot mask-aligner lithography with a 193 nm CW laser light source
2018 · Andreas Vetter, Raoul Kirner, et al. · Optics Express · 14
Chromatic information coding in optical systems for hyperspectral imaging and chromatic confocal sensing
2012 · M. Hillenbrand, A. Grewe, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 14
Improvements on the uniformity of large-area microlens arrays in Fused Silica
2019 · Raoul Kirner, Jeremy Béguelin, et al. · Optics Express · 11
Computational rule-based approach for corner correction of non-Manhattan geometries in mask aligner photolithography
2019 · Andreas Vetter, Chen Yan, et al. · Optics Express · 9
Semiconductor-based narrow-line and high-brilliance 193-nm laser system for industrial applications
2018 · Dmitrijs Opalevs, Matthias Scholz, et al. · SPIE Solid State Lasers: Technology and Devices · 5
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Mask-aligner Talbot lithography using a 193 nm CW light source
2018 · Andreas Vetter, Dmitrijs Opalevs, et al. · SPIE Optical Microlithography · 3
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Advanced mask aligner lithography (AMALITH)
2013 · L. A. Dunbar, G. Bergonzi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Leveraging wafer-level manufacturing process limitations to increase large-scale fused silica microlens array uniformity
2019 · Raoul Kirner, Jeremy Béguelin, et al. · 2
High power modular LED-based illumination system for lithography applications
2018 · Johana Bernasconi, Raoul Kirner, et al. · Nonimaging Optics: Efficient Design for Illumination and Concentration · 2
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Enabling proximity mask-aligner lithography with a 193nm CW light source
2018 · Patrick Leisching, Toralf Scharf, et al. · SPIE Optical Microlithography · 2
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Array imaging system for lithography
2016 · Raoul Kirner, Kevin Mueller, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Speckle: two new metrology techniques
2012 · Dayan Li, Raoul Kirner, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Improving the Resolution in Mask-Aligner Lithography
2018 · Andreas Vetter, Raoul Kirner, et al. · International Conference on Optical MEMS and Nanophotonics · 1
Spatial coherence properties of an LED-based illumination system for mask-aligner lithography
2019 · Johana Bernasconi, Toralf Scharf, et al. · SPIE Novel Patterning Technologies
Coherent Ray Tracing Simulation Of Non-Imaging Laser Beam Shaping With Multi-Aperture Elements
2019 · Raoul Kirner, Wilfried Noell, et al. · EPJ Web of Conferences
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On Advanced Large-Field Photolithography
2019 · Kirner, Raoul · Infoscience (Ecole Polytechnique Fédérale de Lausanne)
Works count: 19
Citation count: 118
H-index: 7
I10-index: 6
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