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Karim Henda

Validity of actinometry to monitor oxygen atom concentration in microwave discharges created by surface wave in O2-N2 mixtures
1994 · A. Granier, D. Chéreau, et al. · Journal of Applied Physics · 85
Study of the deposition of Ti/TiN multilayers by magnetron sputtering
2010 · N. Saoula, S. Djerourou, et al. · Surface and Interface Analysis · 69
Characterization of thermal flame sprayed coatings prepared from FeCr mechanically milled powder
2012 · O. Redjdal, B. Zaid, et al. · Journal of Materials Processing Technology · 37
Influence of bias voltage on the structure and deposition mechanism of diamond‐like carbon films produced by RF (13.56 MHz) CH4 plasma
2010 · M. Ouchabane, H. Salah, et al. · physica status solidi (a) · 13
CHx/PS/Si as structure for propane sensing
2005 · S. Belhousse, N. Gabouze, et al. · Thin Solid Films · 13
Effect of the Plasma Deposition Parameters on the Properties of Ti/TiC Multilayers for Hard Coatings Applications
2012 · N. Saoula, K. Henda, et al. · Acta Physica Polonica A · 12
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Influence of Nitrogen Content on the Structural and Mechanical Properties of TiN Thin Films
2009 · Nadia Saoula, K. Henda · 12
Effect Of The Plasma Deposition Parameters On The Properties Of Ti∕TiN Multilayers For Hard Coatings Applications
2008 · N. Saoula, K. Henda, et al. · AIP conference proceedings · 9
Electrical and optical characterizations of TiC/porous Si/Si structures
2004 · N. Gabouze, K. Ait-Hamouda, et al. · Superlattices and Microstructures · 9
Deposition of Titanium Nitride Thin Films onto Silicon by RF Reactive Magnetron Sputtering
2009 · Nadia Saoula, K. Henda, et al. · Materials science forum · 8
Effect of the Plasma Deposition Parameters on the Properties of Ti/TiC Multilayers for Hard Coatings Applications
2011 · Nadia Saoula, Karim Henda, et al. · Advanced materials research · 4
The Effect of a Multihollow Cathode on the Self-Bias Voltage of Methane RF Discharge Used for a-C:H Deposition
2011 · S. Djerourou, K. Henda, et al. · Journal of Modern Physics · 4
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Effect of the plasma deposition parameters on the properties of TixCy for hard coatings applications
2009 · N. Saoula, K. Henda, et al. · Physics Procedia · 4
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Electrical Characterization of Inductively Coupled Plasma Reactor Excited by RF (13.56MHz)
2011 · Mohamed Mounis Alim, Mourad Zekara, et al. · Advanced materials research · 3
Electrical and optical characterisation of TiN porous Si/Si structures
2006 · N. Benzekkour, N. Gabouze, et al. · Surface and Interface Analysis · 3
Electrochemical behavior of p-Si/TiC in aqueous HF
2003 · S. Ouendadji, K. Ait-Hamouda, et al. · Vacuum · 3
Structural Analysis of Diamond‐Like Carbon Films Deposited by RF (13.56 MHz) in a Methane Gas Plasma Atmosphere
2005 · M. Ouchabane, M. Aoucher, et al. · Plasma Processes and Polymers · 2
New Green Dielectrics Related to Calcium Titanate: Synthesis and Characterizations
2015 · Laldja Taïbi-Benziada, Yazid Khereddine, et al. · Arabian Journal for Science and Engineering · 1
Development of a Radiofrequency Plasma Diagnostic System with a Langmuir Probe and Study of a Capacitively Coupled Argon Plasma
2011 · Djelloul Mendil, Hadj Lahmar, et al. · Advanced materials research · 1
The influence of CHx coating on the optical properties of porous silicon
2006 · N. Benzekkour, N. Gabouze, et al. · Physica E Low-dimensional Systems and Nanostructures · 1
Influence of temperature on electrical characteristics of CHx/porous silicon/Si sensing device
2006 · N. Zouadi, S. Belhousse, et al. · Surface and Interface Analysis · 1
Diagnostic of a RF (13.56MHz) Magnetron in Ar/CH4 Discharge
2011 · Samira Djerourou, Nadia Saoula, et al. · Advanced materials research
On The structure Of Deposited Diamond-Like Carbon Films Produced By Rf (13.56MHz) CH[sub 4] Plasma
2008 · M. Ouchabane, M. Kechouane, et al. · AIP conference proceedings
Effects Of Pressure And Power On The Ionic Saturation Current And Self-Bias Voltage In A RF Discharge 13.56 MHz Of (SF[sub 6], O[sub 2]) At Low Pressure
2008 · M. M. Alim, M. Zekara, et al. · AIP conference proceedings
Electrical And OES Diagnostics Of A Magnetized RF Discharge In CH[sub 4] Created By A Multihole Cathode Used For a-C:H Deposition
2008 · S. Djerourou, K. Henda, et al. · AIP conference proceedings
Works count: 28
Citation count: 294
H-index: 9
I10-index: 7
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