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Author

Youyou Zhou

Institution: Hexi University
ORCID: 0000-0002-5384-4739
Observed ORCID: 0000-0002-5384-4739
OpenAlex ID: A5021178473
Electrical breakdown in dual-frequency capacitively coupled plasma: a collective simulation
2021 · Hao Wu, Youyou Zhou, et al. · Plasma Sources Science and Technology · 57
Investigation of the Growth of Carbon Films by Ar/CH4 Plasma Jet Driven by 100-MHz/100-kHz Dual Frequency Source at Atmospheric Pressure
2020 · Guiqin Yin, Youyou Zhou, et al. · IEEE Transactions on Plasma Science · 16
Numerical characterization of dual-frequency capacitively coupled plasmas modulated by electron beam injection
2024 · Youyou Zhou, Yu Wang, et al. · Physica Scripta · 9
Two‐dimensional particle‐in‐cell/Monte Carlo simulations of streamer formation and propagation in catalyst pores in a surface dielectric barrier discharge
2022 · Xuan Zuo, Youyou Zhou, et al. · Plasma Processes and Polymers · 7
The discharged characteristics of capacitively coupled Ar/N2 plasma driven by the dual frequency 8/100 MHz
2023 · Guiqin Yin, Youyou Zhou, et al. · The European Physical Journal Applied Physics · 5
Computational study of microdischarges driven by electron beam injection with particle-in-cell/Monte Carlo collision simulations
2022 · Yu Wang, Youyou Zhou, et al. · Journal of Applied Physics · 5
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Numerical characterization of capacitively coupled plasmas modulated by ion beam injection
2022 · Youyou Zhou, Yu Wang, et al. · Plasma Sources Science and Technology · 5
Numerical characterization of capacitively coupled plasma driven by tailored frequency modulated radio frequency source
2024 · Yu Wang, Youyou Zhou, et al. · Plasma Sources Science and Technology · 1
Inside Front Cover: Plasma Process. Polym. 8/2022
2022 · Xuan Zuo, Youyou Zhou, et al. · Plasma Processes and Polymers · 1
Dispersion characteristics of bounded waves in a partially ionized laboratory EPI plasma with ion-neutral collisions
2026 · Jiuning Han, Ning Bao, et al. · Physica Scripta
Numerical characterization of capacitively coupled CF4 plasmas modulated by anion beam injection
2024 · Youyou Zhou, Jingwen Xu, et al. · Plasma Sources Science and Technology
Breakdown process of dual-frequency Capacitively Coupled Plasma: A collective simulation
2020 · Hao Wu, Youyou Zhou, et al. · APS Annual Gaseous Electronics Meeting Abstracts
Works count: 12
Citation count: 106
H-index: 5
I10-index: 2
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