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Author

Kazuaki Kurihara

Observed names: K. Kurihara, 栗原和明
ORCID: 0009-0002-7023-8009
Observed ORCID: 0009-0002-7023-8009
OpenAlex ID: A5021755207
In situ analysis of SiO2 films etched under cryogenic conditions using H2/F2/Ar gas mixture plasma
2026 · Yuma Kato, Junji Kataoka, et al. · Applied Physics Letters · 4
Infinite selectivity in dry etching process for high-aspect-ratio hole using C7HF7 gas plasma
2025 · Junji Kataoka, Norikatsu Sasao, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2
Investigation of surface reactions of etched SiN films using HF/PF3 gas mixture plasma under cryogenic conditions via in-line XPS: The role of ammonium salts in etch rate enhancement
2026 · Junji Kataoka, Yuma Kato, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1
Metal-supported Laser-induced Breakdown Spectroscopy for the Trace Elemental Identification of Material
2022 · A. Khumaeni, W. S. Budi, et al. · RASAYAN Journal of Chemistry
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Dry Process FOREWORD
2020 · 白藤 立, Tatsuru Shirafuji, et al. · Institutional Repositories DataBase (IRDB)
Epitaxial Growth of Oxide Thin Films on Si Substrate by Introducing Buffer Layers and Their Applications
2007 · 篠崎 和夫, Kazuo Shinozaki, et al. · Institutional Repositories DataBase (IRDB)
Fabrication and Optical Properties of Pb(Mg_1/3_Nb_2/3_)O_3_-PbTiO_3_ Thin Films on Si Substrates by PLD Method
2007 · 篠崎 和夫, Kazuo Shinozaki, et al. · Institutional Repositories DataBase (IRDB)
Growth of Epitaxial Thin Film on Si Substrate by Introducing Buffer Layers
2005 · 篠崎 和夫, Kazuo Shinozaki, et al. · Institutional Repositories DataBase (IRDB)
Works count: 10
Citation count: 7
H-index: 2
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