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Annaëlle Demaude

Observed names: A. Demaude, Annaelle Demaude, Demaude, Annaelle
Institution: IMEC
ORCID: 0000-0003-1387-8691
Observed ORCID: 0000-0003-1387-8691
OpenAlex ID: A5022361938
Atmospheric Pressure Plasma Deposition of Hydrophilic/Phobic Patterns and Thin Film Laminates on Any Surface
2019 · A. Demaude, C. Poleunis, et al. · Langmuir · 25
Distribution of Copper Electrochemical Nucleation Activities on Glassy Carbon: A New Perspective Based on Local Electrochemistry
2022 · Daniel Torres, Miguel Bernal, et al. · Journal of The Electrochemical Society · 19
Simple and Scalable Chemical Surface Patterning via Direct Deposition from Immobilized Plasma Filaments in a Dielectric Barrier Discharge
2022 · Annaëlle Demaude, Kitty Baert, et al. · Advanced Science · 8
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Tuning the wicking and wettability properties of PET textiles by DBD or a remote atmospheric RF torch: A comparison
2021 · Annaëlle Demaude, Rosanna Inturri, et al. · Plasma Processes and Polymers · 8
Hexagonal contact holes patterning at 32 nm pitch: influence of the stack and of the etching process on AEI performances
2025 · Sara Paolillo, Dieter Van den Heuvel, et al. · Advanced Etch Technology and Process Integration for Nanopatterning · 5
Revisiting the surface characterization of plasma‐modified polymers
2022 · Jorane Berckmans, Annaëlle Demaude, et al. · Plasma Processes and Polymers · 5
New perspectives of atmospheric pressure dielectric barrier discharges for the deposition of thin films: From uncontrolled amorphous plasma-polymer layers to chemically patterned and crystalline (in)organic coatings
2024 · Marie Brabant, Annaelle Demaude, et al. · Surface and Coatings Technology · 4
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Immobilized Microdischarges in Pulsed DBD Plasmas for Localized Deposition and Patterning of Polymer-Like Films
2023 · A. Demaude, D. Petitjean, et al. · Plasma Chemistry and Plasma Processing · 3
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Patterning optimization for single exposure BLP and SNLP DRAM layers with 0.33NA and 0.55NA EUV lithography
2025 · Van Tuong Pham, Victor M. Blanco Carballo, et al. · Advances in Patterning Materials and Processes · 2
Spatially differentiated crystalline inorganic coatings deposited by an atmospheric pressure dielectric barrier discharge with immobilized filaments
2024 · M. Brabant, A. Demaude, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2
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Toward 10nm DRAM with the single exposure patterning: optimization of the processes in 0.55NA EUV lithography
2026 · Van Tuong Pham, Victor Blanco, et al. · SPIE Optical and EUV Nanolithography
P20 High-NA enablement through pattern shaping technology: tip-to-tip engineering, roughness, and defectivity improvement
2026 · Annaëlle Demaude, Alejandro Berdonces Layunta, et al. · Advanced Etch Technology and Process Integration for Nanopatterning
High-NA EUV defectivity inspection: overview and challenges
2025 · Christophe Beral, Dieter Van Den Heuvel, et al. · Metrology, Inspection, and Process Control XXXVI
Easy synthesis of hybrid hydrophilic-hydrophobic patterned surfaces by atmospheric plasmas
2019 · Annaëlle Demaude, Claude Poleunis, et al. · Dépôt institutionnel de l'Université libre de Bruxelles (Université Libre de Bruxelles)
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Easy synthesis of hybrid laterally or vertically patterned hydrophobic/hydrophilic surfaces using a dielectric barrier discharge
2018 · Annaëlle Demaude, Erik Goormaghtigh, et al. · Dépôt institutionnel de l'Université libre de Bruxelles (Université Libre de Bruxelles)
Works count: 20
Citation count: 81
H-index: 5
I10-index: 2
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