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Ryotaro Takahashi
Institution:
Ushio (Japan)
Observed institution:
Ushio (Japan)
ORCID:
0000-0002-6390-2998
Observed ORCID:
0000-0002-6390-2998
OpenAlex ID:
A5022431461
First Demonstration of Stitching-Free Exposure over an Ultra-Large 18-Reticle Area with High-Resolution 1.5μm Line/Space on Glass Substrates
2026
·
Naoya Sohara
, Toshimitsu Arai
, et al.
·
IEEE Electronic Components and Technology Conference (ECTC)
·
2
Investigation from the Lithography of the Possible of Forming Less Than 8 μm Pitch Required for Advanced Packaging
2025
·
Yu Abe
, Naoya Sohara
, et al.
·
International Conference on Electronics Packaging and iMAPS All Asia Conference (ICEP-IAAC)
·
1
Development of panel-level organic lithography equipment for advanced packaging
2024
·
Naoya Sohara
, Yu Abe
, et al.
·
Journal of Micro/Nanopatterning Materials and Metrology
·
1
Verification of resolution considering process margins for the l0μm pitch patterning of organic substrates
2024
·
Naoya Sohara
, Yu Abe
, et al.
·
International Conference on Electronics Packaging (ICEP)
Consideration of Improved Adhesion of Direct Copper Seed Layer by Medium-Vacuum Sputtering Using Vacuum Ultraviolet Light
2023
·
Shinichi Endo
, Akihiro Shimizu
, et al.
·
ECS Meeting Abstracts
Consideration of Improved Adhesion of Direct Copper Seed Layer by Medium-Vacuum Sputtering Using Vacuum Ultraviolet Light
2023
·
Shinichi Endo
, Akihiro Shimizu
, et al.
·
ECS Transactions
PDF
Investigating the fine line lithography process on the large-size organic panels for advanced packaging and development
2020
·
Naoya Sohara
, Ryotaro Takahashi
, et al.
·
SPIE Optical Microlithography
Beam-deflection liquid-crystal devices in a near infrared wavelength
2018
·
Yasuhito Mizuki
, Ryotaro Takahashi
, et al.
·
The Japan Society of Applied Physics
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Works count:
8
Citation count:
4
H-index:
1
I10-index:
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