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Yasushi TOMA
Observed names:
Y. Toma,
Yasushi Toma
Institution:
Ebara (Japan)
Observed institution:
Ebara (Japan)
OpenAlex ID:
A5024968104
Fast Atom Beam Etching of Glass Materials with Contact and Non-Contact Masks
1997
·
Yasushi Toma
, Masahiro Hatakeyama
, et al.
·
Japanese Journal of Applied Physics
·
36
Electron-beam characteristics of double-gated Si field emitter arrays
1996
·
Yasushi Toma
, Seigo Kanemaru
, et al.
·
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena
·
28
Electron beam characteristics of double-gated Si field emitter arrays
2002
·
Y. Toma
, S. Kanemaru
, et al.
·
International Vacuum Nanoelectronics Conference
·
5
Novel fast atom beam (FAB) processes for fabricating functional nanostructures on three-dimensional microstructures
1997
·
M. Hatakeyama
, S. Tanaka
, et al.
·
Microsystem Technologies
·
5
Removal Rate Simulation of Dissolution-Type Electrochemical Mechanical Polishing
2010
·
Akira Fukuda
, Akira Kodera
, et al.
·
Japanese Journal of Applied Physics
·
3
A Study on Electrochemical Machining Method in Ultrapure Water. Increase of Hydroxyl lon in Ultrapure Water by Catalytic Reaction.
2001
·
Yuzo MORI
, Hidekazu GOTO
, et al.
·
Journal of the Japan Society for Precision Engineering
·
3
PDF
A Study on Electrochemical Machining Method in Ultrapure Water. First-Principles Molecular-Dynamics Simulations for Etching Process of Hydrogen-Terminated Si(001) Surface by Hydroxyl Ions.
2001
·
Yuzo MORI
, Hidekazu GOTO
, et al.
·
Journal of the Japan Society for Precision Engineering
·
2
PDF
A Study on Electrochemical Machining Method in Ultrapure Water. Electrochemical Machining of Cathode Surface.
2002
·
Yuzo MORI
, Hidekazu GOTO
, et al.
·
Journal of the Japan Society for Precision Engineering
·
1
PDF
Integrated Fast Atom Beam (FAB) Processes for Fabricating Micro Diffractive Grating Structures and Micro Textured Surfaces
1999
·
Masahiro Hatakeyama
, Katsunori Ichiki
, et al.
·
WORLD SCIENTIFIC eBooks
·
1
Conditioning and Deconditioning Effects on Surface Discharge and Dark Current of Organic Insulator Processed by Pulse Voltage Conditioning in Vacuum
2025
·
Yuki Hagiwara
, Yasushi Yamano
, et al.
·
International Symposium on Discharges and Electrical Insulation in Vacuum
20306 Simulation of Removal Rate Dependency on Polishing Pressure in ECMP
2010
·
Akira FUKUDA
, Akira KODERA
, et al.
·
The Proceedings of Conference of Kanto Branch
PDF
A method of removal rate simulation in electrochemical mechanical polishing
2009
·
Akira Fukuda
, Akira Kodera
, et al.
·
精密工学会大会学術講演会講演論文集
21106 Relationship between removal rate and electrolyte-filling ratio in electro-chemical mechanical polishing
2009
·
Akira FUKUDA
, Xinming WANG
, et al.
·
The Proceedings of Conference of Kanto Branch
PDF
21414 Trial of Cu Clear Process with Electro-Chemical Mechanical Polishing (ECMP)
2008
·
Itsuki KOBATA
, Yutaka WADA
, et al.
·
The Proceedings of Conference of Kanto Branch
PDF
Comparison of the Planarization Technologies for the Next Generation
2007
·
Itsuki Kobata
, Yutaka Wada
, et al.
·
International Conference on Solid State Devices and Materials (SSDM)
21710 Comparison of the Planarization Technologies for the Next Generation
2007
·
Itsuki KOBATA
, Yutaka WADA
, et al.
·
The Proceedings of Conference of Kanto Branch
PDF
Application of Electrochemical Machining in Ultrapure Water to Copper Damascene Process
2004
·
Yuzo MORI
, Hidekazu GOTO
, et al.
·
Seimitsu kougakkaishi rombunshuu/Seimitsu kougakkaishi/Seimitsu Kougakkaishi rombunshuu
PDF
A Study on Electrochemical Machining Method in Ultrapure Water
2003
·
Yuzo Mori
, Hidekazu Goto
, et al.
·
精密工学会大会学術講演会講演論文集
A Study on Electrochemical Machining Method in Ultrapure Water-First-Principles Molecular-Dynamics Simulations of Etching Process on Al(001) Cathode Surface-
2003
·
Hidekazu GOTO
, Kikuji HIROSE
, et al.
·
Journal of the Japan Society for Precision Engineering
PDF
25pPSB-35 First-principles study of etching process of Si(001) surfaceinteracting with ultrapure water
2002
·
Hidekazu Goto
, K. Hirose
, et al.
·
日本物理学会講演概要集
Development of Electrochemical Machining System in Ultrapure Water and Application to Planarization Machining Process.
2002
·
Yuzo MORI
, Hidekazu GOTO
, et al.
·
Journal of the Japan Society for Precision Engineering
PDF
A Study on Electrochemical Machining Method in Ultrapure Water. First-Principles Molecular-Dynamics Simulations for Etching Process of Si(001) Cathode Surface.
2001
·
Hidekazu GOTO
, Kikuji HIROSE
, et al.
·
Journal of the Japan Society for Precision Engineering
PDF
A Study on Electrochemical Machining Method in Ultrapure Water. Chemical Reaction Process of Si(001) Anode Surface.
2001
·
Hidekazu GOTO
, Kikuzi HIROSE
, et al.
·
Journal of the Japan Society for Precision Engineering
PDF
A Study on Electrochemical Machining Method in Ultrapure Water. Etching Process of Si(001) Surface Atom by Hydroxyl Function.
2001
·
Hidekazu GOTO
, Kikuzi HIROSE
, et al.
·
Journal of the Japan Society for Precision Engineering
PDF
A Study on Electrochemical Machining Method in Ultrapure Water. Etching Process of Hydrogen-Terminated Si(001) Surface Atom by Hydroxyl Function.
2001
·
Hidekazu GOTO
, Kikuzi HIROSE
, et al.
·
Journal of the Japan Society for Precision Engineering
PDF
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Works count:
25
Citation count:
84
H-index:
4
I10-index:
2
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