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Takahiro Dazai

OpenAlex ID: A5029118256
Chemically tailored block copolymers for highly reliable sub-10-nm patterns by directed self-assembly
2024 · Shinsuke Maekawa, Takehiro Seshimo, et al. · Nature Communications · 53
Ionic Liquids as Additives to Polystyrene-Block-Poly(Methyl Methacrylate) Enabling Directed Self-Assembly of Patterns with Sub-10 nm Features
2018 · Xuanxuan Chen, Chun Zhou, et al. · ACS Applied Materials & Interfaces · 40
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Influence of Additives on the Interfacial Width and Line Edge Roughness in Block Copolymer Lithography
2020 · Daniel F. Sunday, Xuanxuan Chen, et al. · Chemistry of Materials · 21
Perpendicular orientation control in thin films of POSS-containing block copolymer domains with a top-coat surface treatment
2016 · Takehiro Seshimo, Yoshiyuki Utsumi, et al. · Polymer Journal · 19
Three Dimensional Assembly in Directed Self-assembly of Block Copolymers
2016 · Tamar Segal-Peretz, Chun Zhou, et al. · Journal of Photopolymer Science and Technology · 13
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Installation of the adamantyl group in polystyrene- block -poly(methyl methacrylate) via Friedel–Crafts alkylation to modulate the microphase-separated morphology and dimensions
2023 · Takuya Isono, Ema Baba, et al. · Polymer Chemistry · 8
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High‐Fidelity Directed Self‐Assembly Using Higher‐ χ Polystyrene‐ Block ‐Poly(Methyl Methacrylate) Derivatives for Dislocation‐Free Sub‐10 nm Features
2025 · Shinsuke Maekawa, Lander Verstraete, et al. · Advanced Functional Materials · 7
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Characteristics of low E a 193-nm chemical amplification resists
2006 · Toshiyuki Ogata, Yohei Kinoshita, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Studying the effects of chemistry and geometry on DSA hole-shrink process in three dimensions
2018 · Chun Zhou, Roel Gronheid, et al. · SPIE Novel Patterning Technologies · 2
Ionic Liquid for Directed Self-Assembly of PS-b-PMMA
2016 · Akiya Kawaue, Tasuku Matsumiya, et al. · Journal of Photopolymer Science and Technology · 2
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Guided self-assembly of Si-containing block copolymer with a topcoat surface treatment
2014 · Takehiro Seshimo, Yoshiyuki Utsumi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Optimizing dual-function underlayers for minimal defectivity of directed self-assembly rectified extreme ultraviolet lithography patterns
2025 · Byeong-U Bak, Lander Verstraete, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 1
Development of PS-PMMA Block Copolymers Incorporating Poly(n-butyl methacrylate) for Low Temperature Thermal Annealing toward Perpendicular Microdomain Alignment
2025 · Hsi-Chih Wang, Takehiro Seshimo, et al. · Journal of Photopolymer Science and Technology · 1
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Dual function of precisely modified hydroxy-PS- b -PMMA as neutral layers and thin films for perpendicularly oriented lamella
2024 · Riku Mizusaki, Shinsuke Maekawa, et al. · RSC Applied Interfaces · 1
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Synthesis of ABC/ACB-Type Triblock Copolymers Composed of Polystyrene and Polymethacrylate via Living Anionic Polymerization and Analyzing the Effect of Casting Solvents on Higher-Order Structures
2024 · Ryota Uehara, Shinsuke Maekawa, et al. · Journal of Photopolymer Science and Technology · 1
Desirable material selection on self-aligned multi-patterning
2018 · Kyohei Koike, Kazuki Yamada, et al. · Advances in Patterning Materials and Processes · 1
Sequence-Encoded Perpendicular Orientation in High-χ Triblock Copolymer Thin Films via Central Hydrophobic Block Placement
2026 · Ryota Uehara, Shinsuke Maekawa, et al. · Macromolecules
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Breakthroughs in contact hole patterning enabled by directed self-assembly
2026 · Shota Iino, Takehiro Seshimo, et al. · SPIE Novel Patterning Technologies
The Effect of Side-Chain Modification via Hydrogen Bonding on the Microphase-Separated Structure of PS-b-P4VP-b-PMMA
2025 · Ryota Uehara, Shinsuke Maekawa, et al. · Journal of Photopolymer Science and Technology
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Author response for "Dual function of precisely modified hydroxy-PS-b-PMMA as neutral layers and thin films for perpendicularly oriented lamella"
2024 · Riku Mizusaki, Shinsuke Maekawa, et al. · Publons reviews and discussion
Author response for "Dual function of precisely modified hydroxy-PS-b-PMMA as neutral layers and thin films for perpendicularly oriented lamella"
2024 · Riku Mizusaki, Shinsuke Maekawa, et al. · Publons reviews and discussion
Works count: 22
Citation count: 175
H-index: 7
I10-index: 5
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