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Yoshikazu Nagamura

Observed names: Nagamura, Yoshikazu, ナガムラ, ヨシカズ
ORCID: 0000-0002-9364-9997
Observed ORCID: 0000-0002-9364-9997
OpenAlex ID: A5029255606
Minimization of CNN Training Data by using Data Augmentation for Inline Defect Classification
2020 · Akihiro Fujishiro, Yoshikazu Nagamura, et al. · IEEE International Symposium on Semiconductor Manufacturing conference proceedings · 12
Minimizing Convolutional Neural Network Training Data With Proper Data Augmentation for Inline Defect Classification
2021 · Akihiro Fujishiro, Yoshikazu Nagamura, et al. · IEEE Transactions on Semiconductor Manufacturing · 8
Novel Technique for Phase-Shifting-Mask Repair Using Focused-Ion-Beam Etch-Back Process
1992 · Kunihiro Hosono, Yoshikazu Nagamura, et al. · Japanese Journal of Applied Physics · 8
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Layout Feature Extraction Using CNN Classification in Root Cause Analysis of LSI Defects
2021 · Yoshikazu Nagamura, Koji Arima, et al. · IEEE Transactions on Semiconductor Manufacturing · 6
CNN-Based Layout Segment Classification for Analysis of Layout-Induced Failures
2020 · Yoshikazu Nagamura, Takashi Ide, et al. · IEEE Transactions on Semiconductor Manufacturing · 6
Note on CapsNet-Based Wafer Map Defect Pattern Classification
2021 · Itsuki Fujita, Yoshikazu Nagamura, et al. · Proceedings - Asian Test Symposium/Proceedings · 5
Layout-based test coverage verification for high-reliability devices
2016 · Yoshikazu Nagamura, Kenji Shiozawa, et al. · IEEE International Symposium on Semiconductor Manufacturing conference proceedings · 3
Photomask quality assessment strategy at 90-nm technology node with aerial image simulation
2003 · Yoshikazu Nagamura, Kunihiro Hosono, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Development of refined cleaning technique focusing on an ecological viewpoint
2001 · Koji Tange, Yoshikazu Nagamura, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
High-performance photomask cleaning process using electrolyzed water
1998 · Yoshikazu Nagamura, Hozumi Usui, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Self-Training-Based Wafer Map Defect Pattern Labeling for Classification Accuracy Improvement
2026 · Masaru Kurokawa, Yoshikazu Nagamura, et al. · International Journal of Reliability Quality and Safety Engineering · 1
Mixed-Defect Wafer Map Classification Using CapsNet-Based Models With Precise Scratch-Pattern Reconstruction
2025 · Yoshikazu Nagamura, Yuki Yamanaka, et al. · IEEE Access · 1
Toward Improvement and Evaluation of Reconstruction Capability of CapsNet-Based Wafer Map Defect Pattern Classifier
2023 · Yuki Yamanaka, Masayuki Arai, et al. · IEEE International Test Conference in Asia (ITC-Asia) · 1
Layout-Based Test Coverage Verification for High-Reliability Devices
2017 · Yoshikazu Nagamura, Kenji Shiozawa, et al. · IEEE Transactions on Semiconductor Manufacturing · 1
Development of mask-DFM system MiLE load estimation of mask manufacturing
2007 · Yoshikazu Nagamura, Kunihiro Hosono, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Estimation of shot counts in VSB writer using GDSII design data
2007 · Shogo Narukawa, Hiroshi Mohri, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Defect printability and inspection capability for tri-tone PSM
2003 · Yoshikazu Nagamura, Kazuyuki Maetoko, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
New repair of clear defects on half-tone PSM using Ga implantation
2003 · Yoshikazu Nagamura, Itaru Kanai, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Note on CNN-Based Defect Location Estimation on LSI Layouts
2020 · Yoshikazu Nagamura, Masayuki Arai, et al. · IEICE Technical Report; IEICE Tech. Rep.
Verification of mask manufacturing load estimation (MiLE)
2008 · Yoshikazu Nagamura, Shogo Narukawa, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Defect quality management of 248nm alt-PSM in low-k1 condition
2005 · Yoshikazu Nagamura, Satoshi Momose, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Development of refined cleaning technique focusing on ecological viewpoint
2002 · Koji Tange, Yoshikazu Nagamura, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Studies on Circuit Layout Analysis for the Reliability of LSI Devices
· ナガムラ, ヨシカズ, 永村, 美一, et al. · Institutional Repositories DataBase (IRDB)
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Works count: 24
Citation count: 63
H-index: 5
I10-index: 1
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