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Daehan Han
Observed name:
Dae-Han Han
Institution:
Samsung Electronics (South Korea)
Observed institutions:
Samsung (South Korea),
Samsung Electronics (South Korea)
OpenAlex ID:
A5031599466
The cell pattern correction through design-based metrology
2015
·
Yonghyeon Kim
, Kweonjae Lee
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
4
The analysis method of the DRAM cell pattern hotspot
2015
·
Kyusun Lee
, Kweonjae Lee
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
3
Applications of DBV (design-based verification) for steep ramp-up manufacture
2011
·
Tae Heon Kim
, Dae-Han Han
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
3
The new analysis method of PWQ in the DRAM pattern
2016
·
Daehan Han
, Jinman Chang
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
A study of pattern variability for device performance
2012
·
Tae-Heon Kim
, Dae-Han Han
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
70nm DRAM technology for DDR-3 application
2005
·
Hyungtak Kim
, Sangho Kim
, et al.
·
1
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Works count:
6
Citation count:
13
H-index:
3
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