Get started
Author

Apoorva B. Oak

Observed names: Apoorva Oak, Oak, Apoorva
Institution: IMEC
ORCID: 0000-0002-0926-848X
Observed ORCID: 0000-0002-0926-848X
OpenAlex ID: A5034538221
Impact of SiN Composition Variation on SANOS Memory Performance and Reliability Under nand (FN/FN) Operation
2009 · C. Sandhya, Apoorva B. Oak, et al. · IEEE Transactions on Electron Devices · 30
28nm pitch single exposure patterning readiness by metal oxide resist on 0.33NA EUV lithography
2021 · Danilo De Simone, Luka Kljucar, et al. · 26
Study of P/E Cycling Endurance Induced Degradation in SANOS Memories Under NAND (FN/FN) Operation
2010 · C. Sandhya, Apoorva B. Oak, et al. · IEEE Transactions on Electron Devices · 9
Manufacturing-friendly curvilinear standard cell design
2024 · Ryoung-Han . Kim, Apoorva Oak, et al. · 8
Curvilinear Standard Cell Design for Semiconductor Manufacturing
2024 · Ryoung-Han Kim, Soobin Hwang, et al. · IEEE Transactions on Semiconductor Manufacturing · 4
EUV single patterning exploration for pitch 28 nm
2021 · Dongbo Xu, Werner Gillijns, et al. · 3
Study of EUV stochastic defect on wafer yield
2024 · Yi-Pei Tsai, Chieh-Miao Chang, et al. · 2
Quantifying process sensitivities for EUV and high-NA using machine learning based analytics
2023 · Apoorva Oak, Ryan Ryoung-Han Kim, et al. · 2
Machine learning based recursive partitioning for simplifying OPC model building complexity
2021 · Apoorva Oak, Soobin Hwang, et al. · 2
Innovative design solutions for avoiding at-resolution field stitching in high-NA EUV lithography
2025 · Kenichi Miyaguchi, Ryoung-Han Kim, et al. · 1
Exploring high-NA EUV mask specification for logic metal
2024 · Kenichi Miyaguchi, Soobin Hwang, et al.
Quantifying process parameter impact on edge placement error using machine learning based analytical engine
2022 · Apoorva Oak
Works count: 13
Citation count: 87
H-index: 4
I10-index: 2
Year
Topic
Type