Author

Shyam Sridhar

Observed institutions: Tokyo Electron (Japan), University of Houston, University at Buffalo, State University of New York

ORCID: 0000-0003-0342-4282

Observed ORCID: 0000-0003-0342-4282

OpenAlex ID: A5035296819

Monte Carlo simulation strategies for computing the wetting properties of fluids at geometrically rough surfaces

2011 · Vaibhaw Kumar, Shyam Sridhar, et al. · The Journal of Chemical Physics · 51

Photo-assisted etching of silicon in chlorine- and bromine-containing plasmas

2014 · Weiye Zhu, Shyam Sridhar, et al. · Journal of Applied Physics · 33

Role of physisorption in atomic layer etching of silicon nitride

2020 · Shyam Sridhar, Peter L. G. Ventzek, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 19

Insights into the mechanism of in-plasma photo-assisted etching using optical emission spectroscopy

2016 · Shyam Sridhar, Lei Liu, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 18

Ignition delay of a pulsed inductively coupled plasma (ICP) in tandem with an auxiliary ICP

2015 · Lei Liu, Shyam Sridhar, et al. · Journal of Physics D Applied Physics · 17

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External control of electron energy distributions in a dual tandem inductively coupled plasma

2015 · Lei Liu, Shyam Sridhar, et al. · Journal of Applied Physics · 17

Process optimization for shallow trench isolation etch using computational models

2023 · Shuo Huang, Prem Panneerchelvam, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 13

Selective etching of TiN over TaN and vice versa in chlorine-containing plasmas

2013 · Hyungjoo Shin, Weiye Zhu, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 13

Peculiarities of selective isotropic Si etch to SiGe for nanowire and GAA transistors

2019 · Christopher Catano, Nicholas Joy, et al. · Advanced Etch Technology and Process Integration for Nanopatterning · 9

Functionalization of Polymer Surfaces for Organic Photoresist Materials

2025 · Roberto C. Longo, Xiuyao Lang, et al. · ACS Applied Materials & Interfaces · 6

Ordering of lamellar block copolymers on oxidized silane coatings

2016 · Nikhila Mahadevapuram, Indranil Mitra, et al. · European Polymer Journal · 3

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Preferential Halogen Adsorption on Si, Ge, and SiGe Surfaces for Selective Etching

2026 · Roberto C. Longo, Patrick Conlin, et al. · ACS Applied Engineering Materials · 2

Process optimization for shallow trench isolation etch using computational models

2023 · Shuo Huang, Prem Panneerchelvam, et al. · Advanced Etch Technology and Process Integration for Nanopatterning · 2

Control of electron energy distributions in inductively coupled plasmas using tandem sources

2013 · Michael D. Logue, Mark J. Kushner, et al. · IEEE International Conference on Plasma Science (ICOPS) · 1

EUV quantum yield of organotin molecular resists: a first principles study

2026 · Roberto Longo, Shyam Sridhar, et al. · DTCO and Computational Patterning

Unraveling crosslinking effects in EUV metal oxide photoresist performance via large-scale atomistic simulations

2026 · Ching-Yu Huang, Gyeong Hwang, et al. · Advances in Patterning Materials and Processes

Designing pulsed plasma etch processes by genetic algorithm

2026 · Patrick Conlin, Shyam Sridhar, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Photochemical conversion of organotin molecular EUV resists: a first principles study

2025 · Roberto Longo, Megan Carruth, et al. · DTCO and Computational Patterning

Investigating crosslinking mechanisms in metal oxide photoresists for EUV lithography: a first principles study

2025 · Ching-Yu Huang, Zhiying Chen, et al. · Advances in Patterning Materials and Processes

(Invited) Engineering Semiconducting and Dielectric Materials and Processes Using Integrative Methods

2024 · Peter Ventzek, Jianping Zhao, et al. · ECS Meeting Abstracts

(Invited) Surface Chemistry Control in Advanced Plasma Processes

2022 · Peter Ventzek, Shyam Sridhar, et al. · ECS Meeting Abstracts

Challenges in the patterning of RRAM devices for analog computing applications (Conference Presentation)

2020 · Iqbal Saraf, Shyam Sridhar, et al. · Advanced Etch Technology and Process Integration for Nanopatterning

Selective dry etching of silicon containing anti-reflective coating

2018 · Shyam Sridhar, Andrew Nolan, et al. · Advanced Etch Technology and Process Integration for Nanopatterning

Photo-Assisted Etching in Halogen Containing Plasmas

2016 · Shyam Sridhar

Ignition Delay in a Pulsed Inductively Coupled Plasma (ICP) in Tandem with an Auxiliary ICP

2015 · Vincent M. Donnelly, Lei Liu, et al. · Bulletin of the American Physical Society

Works count: 30

Citation count: 204

H-index: 9

I10-index: 8