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Itsuki Kobata

Observed names: I. Kobata, Itsuki KOBATA
OpenAlex ID: A5036485052
Chemisorption of OH on the H-terminated Si(001) surface
1999 · Hidekazu Goto, Kikuji Hirose, et al. · Computational Materials Science · 5
The enabling solution of Cu/low-k planarization technology
2005 · Y. Wada, I. Noji, et al. · IEEE International Interconnect Technology Conference (IITC) · 4
A Study on Electrochemical Machining Method in Ultrapure Water. Increase of Hydroxyl lon in Ultrapure Water by Catalytic Reaction.
2001 · Yuzo MORI, Hidekazu GOTO, et al. · Journal of the Japan Society for Precision Engineering · 3
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Advanced CMP processes for 450mm applications
2016 · H. M. Wang, I. Kobata, et al. · ASMC proceedings · 2
A Study on Electrochemical Machining Method in Ultrapure Water. First-Principles Molecular-Dynamics Simulations for Etching Process of Hydrogen-Terminated Si(001) Surface by Hydroxyl Ions.
2001 · Yuzo MORI, Hidekazu GOTO, et al. · Journal of the Japan Society for Precision Engineering · 2
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Evolving Preston’s Equation in Chemical Mechanical Planarization
2024 · Jichul Yang, Itsuki Kobata, et al. · ECS Meeting Abstracts · 1
A Study on Electrochemical Machining Method in Ultrapure Water. Electrochemical Machining of Cathode Surface.
2002 · Yuzo MORI, Hidekazu GOTO, et al. · Journal of the Japan Society for Precision Engineering · 1
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21414 Trial of Cu Clear Process with Electro-Chemical Mechanical Polishing (ECMP)
2008 · Itsuki KOBATA, Yutaka WADA, et al. · The Proceedings of Conference of Kanto Branch
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Comparison of the Planarization Technologies for the Next Generation
2007 · Itsuki Kobata, Yutaka Wada, et al. · International Conference on Solid State Devices and Materials (SSDM)
21710 Comparison of the Planarization Technologies for the Next Generation
2007 · Itsuki KOBATA, Yutaka WADA, et al. · The Proceedings of Conference of Kanto Branch
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Application of Electrochemical Machining in Ultrapure Water to Copper Damascene Process
2004 · Yuzo MORI, Hidekazu GOTO, et al. · Seimitsu kougakkaishi rombunshuu/Seimitsu kougakkaishi/Seimitsu Kougakkaishi rombunshuu
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A Study on Electrochemical Machining Method in Ultrapure Water
2003 · Yuzo Mori, Hidekazu Goto, et al. · 精密工学会大会学術講演会講演論文集
A Study on Electrochemical Machining Method in Ultrapure Water-First-Principles Molecular-Dynamics Simulations of Etching Process on Al(001) Cathode Surface-
2003 · Hidekazu GOTO, Kikuji HIROSE, et al. · Journal of the Japan Society for Precision Engineering
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25pPSB-35 First-principles study of etching process of Si(001) surfaceinteracting with ultrapure water
2002 · Hidekazu Goto, K. Hirose, et al. · 日本物理学会講演概要集
Development of Electrochemical Machining System in Ultrapure Water and Application to Planarization Machining Process.
2002 · Yuzo MORI, Hidekazu GOTO, et al. · Journal of the Japan Society for Precision Engineering
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A Study on Electrochemical Machining Method in Ultrapure Water. First-Principles Molecular-Dynamics Simulations for Etching Process of Si(001) Cathode Surface.
2001 · Hidekazu GOTO, Kikuji HIROSE, et al. · Journal of the Japan Society for Precision Engineering
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A Study on Electrochemical Machining Method in Ultrapure Water. Chemical Reaction Process of Si(001) Anode Surface.
2001 · Hidekazu GOTO, Kikuzi HIROSE, et al. · Journal of the Japan Society for Precision Engineering
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A Study on Electrochemical Machining Method in Ultrapure Water. Etching Process of Si(001) Surface Atom by Hydroxyl Function.
2001 · Hidekazu GOTO, Kikuzi HIROSE, et al. · Journal of the Japan Society for Precision Engineering
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A Study on Electrochemical Machining Method in Ultrapure Water. Etching Process of Hydrogen-Terminated Si(001) Surface Atom by Hydroxyl Function.
2001 · Hidekazu GOTO, Kikuzi HIROSE, et al. · Journal of the Japan Society for Precision Engineering
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Works count: 19
Citation count: 18
H-index: 3
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