Product
Help
Pricing
About
Jobs
Log in
Get started
Author
Add to collection
K. Park
Observed name:
Keumseok Park
Institution:
Samsung Electronics (South Korea)
Observed institution:
Samsung Electronics (South Korea)
OpenAlex ID:
A5036693448
Monolithic Stacked FET with Stepped Channels for Future Logic Technologies
2024
·
Chen Zhang
, SeungMin Song
, et al.
·
Technical digest - International Electron Devices Meeting/Technical digest
·
15
Subtractive Ru Interconnect Enabled by Novel Patterning Solution for EUV Double Patterning and TopVia with Embedded Airgap Integration for Post Cu Interconnect Scaling
2022
·
C. Penny
, K. Motoyama
, et al.
·
Technical digest - International Electron Devices Meeting/Technical digest
·
13
Co-doped Ru liners for highly reliable Cu interconnects with selective Co cap
2020
·
K. Motoyama
, O. van der Straten
, et al.
·
IEEE International Interconnect Technology Conference (IITC)
·
12
Microstructural Characterization in Reliability Measurement of PRAM
2010
·
J. Bae
, K. Hwang
, et al.
·
International Conference on Solid State Devices and Materials (SSDM)
Show more works
View as search
Works count:
4
Citation count:
40
H-index:
3
I10-index:
3
Year
Topic
Type
