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Author

Colbert Lu

OpenAlex ID: A5037278641
Practical lithography hotspot identification using mask process model
2019 · Pai Chi Chen, Chain Ting Huang, et al. · SPIE Photomask Technology Conference · 1
Process window discovery from mask inspection for hotspot analysis and verification
2017 · James Cheng, William Chou, et al. · SPIE Photomask Technology Conference · 1
The CD control improvement by using CDSEM 2D measurement of complex OPC patterns
2016 · William Chou, Jeffrey Cheng, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Productivity-enhanced mask inspection application for mature node coverage
2024 · Maxwel Lee, Eric Wang, et al. · SPIE Photomask Technology Conference
Local registration (LREG) measurement for beam deflector monitoring
2024 · Chun Chieh Han, Yi Chen Chuang, et al. · Photomask and next-generation lithography mask technology. Conference
Accurate Mask Model Approaches for Wafer Hot Spot Prepdition and Verificaition
2020 · Young Ham, Colbert Lu, et al. · China Semiconductor Technology International Conference (CSTIC)
Characterization of quartz etched depth and optical density of opaque pattern for the wafer CD behavior on advanced mask
2019 · William Chou, Jeffrey Cheng, et al. · SPIE Photomask Technology Conference
The Study of Mask Crosstalk Defects from Developer and Etching
2019 · Heng-Jen Lee, Yuan Hsu, et al. · China Semiconductor Technology International Conference (CSTIC)
現像とエッチングからのマスククロストーク欠陥の研究【jst・京大機械翻訳】
2019 · Lee Heng-Jen, Hsu Yuan, et al. · IEEE Conference Proceedings
Hotspot analysis and empirical correction through mask and wafer technology harmonization
2018 · Yohan Choi, William Chou, et al. · SPIE Photomask Technology Conference
The CD Control Improvement by Using CDSEM 2D Measurement of Complex OPC Patterns
2016 · C Headley William, C Hammonds Jeffrey, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
In die mask overlay control for 14nm double-patterning lithography
2015 · William Chou, James Cheng, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Utilize AIMS simulation to estimate profile side-wall angle
2006 · Colbert Lu, C. H. Lin, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
AIMS-fab SPEC for defect repair and better repair profile
2004 · Colbert Lu, William Y. Chou, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
CD uniformity improvement by loading effect correction (LEC) function for 90-nm reticle
2004 · Colbert Lu, Torey Huang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Advanced CD Linearity Improvement for Multi-Project Wafers and SoC at 95 nm Technology Node
2002 · Jeremy Lu, Nicole L. Sandlin, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Works count: 16
Citation count: 3
H-index: 1
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