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Kiro Jung
Observed institution:
AP Systems (South Korea)
OpenAlex ID:
A5037467944
Fine metal mask material and manufacturing process for high‐resolution active‐matrix organic light‐emitting diode displays
2020
·
Chiwoo Kim
, Kisoo Kim
, et al.
·
Journal of the Society for Information Display
·
40
37‐1: Invited Paper : 800 PPI FMM Processing System using Femtosecond Laser
2017
·
Jong Kab Park
, Jungyu Hur
, et al.
·
SID Symposium Digest of Technical Papers
·
21
61‐1: FMM Pixel Patterning for Various OLED Displays
2020
·
Chiwoo Kim
, Kisoo Kim
, et al.
·
SID Symposium Digest of Technical Papers
·
12
17‐5: Enhancement of Luminance Efficiency of 3,000ppi OLED Micro‐display using RGB Direct Patterning
2023
·
Jae Hoon Jung
, Myong Hwan Choi
, et al.
·
SID Symposium Digest of Technical Papers
·
10
27.2: Invited Paper: High resolution FMM process for AMOLED displays
2019
·
Chiwoo Kim
, Kisoo Kim
, et al.
·
SID Symposium Digest of Technical Papers
·
9
11‐3: 2,400ppi RGB Side‐by‐Side OLED Micro‐Display for AR Applications
2021
·
Chiwoo Kim
, Jae Hoon Jung
, et al.
·
SID Symposium Digest of Technical Papers
·
7
76‐1: Invited Paper: FMM Material and Manufacturing Process for UHD Resolution AMOLED Displays
2019
·
Chiwoo Kim
, Kisoo Kim
, et al.
·
SID Symposium Digest of Technical Papers
·
7
1.1: Invited Paper: OLED Micro‐display using RGB Direct Patterning Technology
2022
·
Jae Hoon Jung
, Chiwoo Kim
, et al.
·
SID Symposium Digest of Technical Papers
·
6
55.3: Invited Paper: RGB side‐by‐side OLED Micro‐display Technology
2021
·
Jae Hoon Jung
, Chiwoo Kim
, et al.
·
SID Symposium Digest of Technical Papers
·
5
75‐4: Invited Paper: FMM Materials and Manufacturing Process: Review of the Technical Issues
2018
·
Kisoo Kim
, Chiwoo Kim
, et al.
·
SID Symposium Digest of Technical Papers
·
5
Development of 3,000 ppi RGB Direct Patterning OLED Micro-Display
2021
·
Chiwoo Kim
, Jae Hoon Jung
, et al.
·
Proceedings of the International Display Workshops
·
2
64‐4: ECR Plasma Source for Copper Thin Film Dry Etching
2024
·
Jin Nyoung Jang
, Jong Hwa Lee
, et al.
·
SID Symposium Digest of Technical Papers
·
1
51‐3: Copper Thin Film Dry Etching Equipment via ECR Plasma Source
2023
·
Jin Nyoung Jang
, Jong Hwa Lee
, et al.
·
SID Symposium Digest of Technical Papers
·
1
55‐3: Development of Low‐Temperature Metal Dry‐Etching Equipment via ECR Plasma Source
2022
·
Chiwoo Kim
, Jae Hoon Jung
, et al.
·
SID Symposium Digest of Technical Papers
·
1
64‐3: Laser Crystallization of Amorphous Silicon via Spot Beam Annealing Method
2024
·
Won Hee Han
, Jin Nyoung Jang
, et al.
·
SID Symposium Digest of Technical Papers
PDF
Highly Conductive Metal Film Dry Etching via ECR Plasma Source
2023
·
JinNyoung Jang
, Jong Hwa Lee
, et al.
·
Proceedings of the International Display Workshops
27.1: Invited Paper: FMM Material and Manufacturing Process for High Resolution AMOLED Displays
2021
·
Chiwoo Kim
, Kisoo Kim
, et al.
·
SID Symposium Digest of Technical Papers
Photo-Induced Chemical Vapor Deposition of $SiO_2$ Thin Film by Direct Excitation Process
1989
·
Youn-Tae Kim
, Chi-Hoon Kim
, et al.
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Works count:
18
Citation count:
127
H-index:
7
I10-index:
4
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