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Author

Rik Hoefnagels

Observed name: R. Hoefnagels
Institution: ASML (Netherlands)
Observed institution: ASML (Netherlands)
OpenAlex ID: A5039352623
Improvements in resist performance towards EUV HVM
2017 · Oktay Yildirim, Elizabeth Buitrago, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 69
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Sensitivity enhancement of chemically amplified resists and performance study using extreme ultraviolet interference lithography
2016 · Elizabeth Buitrago, Seiji Nagahara, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 25
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Challenge toward breakage of RLS trade-off for EUV lithography by Photosensitized Chemically Amplified Resist (PSCAR) with flood exposure
2016 · Seiji Nagahara, Michael Carcasi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 22
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Progress in EUV resists towards high-NA EUV lithography
2019 · Xiaolong Wang, Zuhal Tasdemir, et al. · Extreme Ultraviolet (EUV) Lithography · 21
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State-of-the-art EUV materials and processes for the 7nm node and beyond
2017 · Elizabeth Buitrago, Marieke Meeuwissen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 20
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Novel high sensitivity EUV photoresist for sub-7nm node
2016 · Tomoki Nagai, Hisashi Nakagawa, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 19
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Novel High Sensitivity EUV Photoresist for Sub-7 nm Node
2016 · Tomoki Nagai, Hisashi Nakagawa, et al. · Journal of Photopolymer Science and Technology · 19
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Evaluation of EUV resist performance using interference lithography
2015 · E. Buitrago, O. Yildirim, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 15
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Evaluation of EUV resist performance below 20nm CD using helium ion lithography
2014 · Diederik Maas, Emile van Veldhoven, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 15
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Chemically-amplified EUV resists approaching 11 nm half-pitch
2018 · Iacopo Mochi, Karen Garrido Olvera, et al. · Extreme Ultraviolet (EUV) Lithography · 12
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Evaluation of EUV resists for 5nm technology node and beyond
2018 · Zuhal Tasdemir, Iacopo Mochi, et al. · International Conference on Extreme Ultraviolet Lithography · 10
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Sensitivity enhancement of chemically amplified resists and performance study using EUV interference lithography
2016 · Elizabeth Buitrago, Seiji Nagahara, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10
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Advanced development methods for high-NA EUV lithography
2023 · Cong Que Dinh, Seiji Nagahara, et al. · Advances in Patterning Materials and Processes · 9
Understanding of Out-of-Band DUV light in EUV lithography: controlling impact on imaging and mitigation strategies
2015 · N. Davydova, R. Kottumakulal, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
Today’s scorecard for tomorrow’s photoresist: progress and outlook towards High-NA EUV lithography
2021 · Jara G. SantaClara, Gijsbert Rispens, et al. · Advances in Patterning Materials and Processes · 7
The NIST EUV facility for advanced photoresist qualification using the witness-sample test
2011 · S. Grantham, C. Tarrio, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
Advanced processes in metal-oxide resists for high-NA EUV lithography
2024 · Cong Que Dinh, Seiji Nagahara, et al. · Advances in Patterning Materials and Processes · 6
Stable stitching: impact and mitigation of environment on metal-oxide resist imaging
2025 · Patricia P. Marin San Roman, Sonia Castellanos, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 5
Impact of acid statistics on EUV local critical dimension uniformity
2017 · Jing Jiang, Danilo De Simone, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Extending EUV lithography for DRAM applications
2020 · Gijsbert Rispens, Claire Van Lare, et al. · SPIE Conference on Extreme Ultraviolet (EUV) Lithography · 4
Contrast matching of line gratings obtained with NXE3XXX and EUV- interference lithography
2017 · Zuhal Tasdemir, Yasin Ekinci, et al. · International Conference on Extreme Ultraviolet Lithography · 3
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Enabling cost effective patterning by addressing the origins of resist stochastics
2025 · Joost van Bree, Bram Slachter, et al. · Advances in Patterning Materials and Processes · 2
0.55NA EUV contact hole process optimization to enhance depth of focus
2026 · Rik Hoefnagels, Jelte van der Valk, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 1
Out-of-band DUV light and standing waves in EUV lithography
2026 · Mark van de Kerkhof, Tian Gang, et al. · International Conference on Extreme Ultraviolet Lithography
Optimization of positive-tone metal-oxide resist process for high-NA DRAM applications
2026 · Herman Nicolai, Peter De Schepper, et al. · International Conference on Extreme Ultraviolet Lithography
Works count: 29
Citation count: 314
H-index: 10
I10-index: 12
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