Get started
Author

Rongbo Zhao

Trends in photoresist materials for extreme ultraviolet lithography: A review
2023 · Xiaolin Wang, Peipei Tao, et al. · Materials Today · 232
Inverse kinematic solution of 6R robot manipulators based on screw theory and the Paden–Kahan subproblem
2018 · Rongbo Zhao, Zhiping Shi, et al. · International Journal of Advanced Robotic Systems · 40
PDF
Machine Learning Applied to Electron Beam Lithography to Accelerate Process Optimization of a Contact Hole Layer
2024 · Rongbo Zhao, Xiaolin Wang, et al. · ACS Applied Materials & Interfaces · 16
Machine learning in electron beam lithography to boost photoresist formulation design for high-resolution patterning
2024 · Rongbo Zhao, Xiaolin Wang, et al. · Nanoscale · 14
Canny Algorithm Enabling Precise Offline Line Edge Roughness Acquisition in High-Resolution Lithography
2023 · Ziyu Hu, Rongbo Zhao, et al. · ACS Omega · 13
PDF
Critical dimension prediction of metal oxide nanoparticle photoresists for electron beam lithography using a recurrent neural network
2023 · Rongbo Zhao, Xiaolin Wang, et al. · Nanoscale · 12
Aberration optimization in an extreme ultraviolet lithography projector via a BP neural network and simulated annealing algorithm
2021 · Rongbo Zhao, Lisong Dong, et al. · Applied Optics · 12
Process optimization of contact hole patterns via a simulated annealing algorithm in extreme ultraviolet lithography
2023 · Rongbo Zhao, Yayi Wei, et al. · Applied Optics · 8
Convolutional Neural Network-Assisted Photoresist Formulation Discriminator Design of a Contact Layer for Electron Beam Lithography
2024 · Rongbo Zhao, Yayi Wei, et al. · The Journal of Physical Chemistry Letters · 6
Process optimization of line patterns in extreme ultraviolet lithography using machine learning and a simulated annealing algorithm
2023 · Rongbo Zhao, Ziyu Hu, et al. · Applied Optics · 6
Analysis and modulation of aberration in an extreme ultraviolet lithography projector via rigorous simulation and a back propagation neural network
2020 · Rongbo Zhao, Lisong Dong, et al. · Applied Optics · 4
Impact of mask topography and flare on process window of EUV lithography
2019 · Rongbo Zhao, Lisong Dong, et al. · International Conference on Extreme Ultraviolet Lithography · 2
Impact of flare on source mask optimization in EUVL for 7nm technology node
2020 · Lisong Dong, Rui Chen, et al. · SPIE Conference on Extreme Ultraviolet (EUV) Lithography · 1
Exploring the Structural, Electronic, and Chemical Bonding Properties of Ge3C3– and Ge3C4– Clusters via Theoretical Calculations
2026 · Li-Juan Zhao, Rongbo Zhao · ACS Omega
PDF
Works count: 14
Citation count: 366
H-index: 8
I10-index: 7
Year
Topic
Type