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Author

Shogo Narukawa

Observed name: Narukawa Shogo
Observed institution: Dai Nippon Printing (Japan)
OpenAlex ID: A5040239436
Electron beam inspection of 16nm HP node EUV masks
2012 · Takeya Shimomura, Shogo Narukawa, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11
Advanced mask rule check (MRC) tool
2006 · Kokoro Kato, Kuninori Nishizawa, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
A novel mask proximity correction software combining accuracy and reduced writing time for the manufacturing of advanced photomasks
2012 · Patrick Schiavone, Luc Martin, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Mask pattern quality assurance based on lithography simulation with fine pixel SEM image
2005 · Mitsuyo Kariya, Eiji Yamanaka, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Reticle SEM specifications required for lithography simulation
2005 · Mitsuyo Kariya, Eiji Yamanaka, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Evaluation of OASIS.VSB (SEMI P44) for practical use
2006 · Koki Kuriyama, Toshio Suzuki, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Mask rule check for inspection of leading-edge photomask
2005 · Wakahiko Sakata, Kiyoshi Yamasaki, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Development of mask-DFM system MiLE load estimation of mask manufacturing
2007 · Yoshikazu Nagamura, Kunihiro Hosono, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Estimation of shot counts in VSB writer using GDSII design data
2007 · Shogo Narukawa, Hiroshi Mohri, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Fine pixel SEM image for mask pattern quality assurance based on lithography simulation
2006 · Eiji Yamanaka, Mitsuyo Kariya, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Photomask pattern viewer and analyzer: HOTSCOPE
2005 · Shogo Narukawa, Kiyoshi Yamasaki, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Evaluation of mask data preparation with OASIS and P10
2005 · Koki Kuriyama, Yuji Machiya, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
EB resolution capability with CP exposure
2011 · Masaki Kurokawa, Hideaki Isobe, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
CMP dummy pattern based on VSB writer load
2010 · Wakahiko Sakata, Isaku Osawa, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Evaluation of mask data format standard OASIS.MASK developed for mask tools
2009 · Toshio Suzuki, Yoshinori Nagaoka, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Verification of mask manufacturing load estimation (MiLE)
2008 · Yoshikazu Nagamura, Shogo Narukawa, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Making of P10-JOBDECK with OASIS and GDS-II fit for practical use
2007 · Masayoshi Mori, Shogo Narukawa, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
フォトマスクパターンビュアー及びアナライザ:hotscope | 文献情報 | J-global 科学技術総合リンクセンター
2005 · Narukawa Shogo, Yamasaki Kiyoshi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Works count: 18
Citation count: 38
H-index: 4
I10-index: 1
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