Author

Enrico Bellandi

Observed names: E Bellandi, E. Bellandi

Observed institutions: University of Pavia, Micron (Italy), STMicroelectronics (Italy)

OpenAlex ID: A5040457807

Transition from relaxed to derelaxed amorphous silicon: Optical characterization

1993 · R. Reitano, M. G. Grimaldi, et al. · Journal of Applied Physics · 24

Quantitative evaluation of bulk-diffused metal contamination by lifetime techniques

1998 · M.L Polignano, E Bellandi, et al. · Materials Science and Engineering B · 19

High-k Materials in Flash Memories

2006 · Mauro Alessandri, Rossella Piagge, et al. · ECS Transactions · 15

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Optical characterization of oxynitride films in the visible-ultraviolet range

1993 · A. Borghesi, E. Bellandi, et al. · Applied Physics A · 13

Influence of annealing temperature on structural, electrical and optical properties of WSi2

1992 · M. Amiotti, E. Bellandi, et al. · Applied Physics A · 7

SiO2 etch rate modification by ion implantation

2012 · E. Bellandi, V. Soncini · Thin Solid Films · 5

Influence of Wet Cleaning on Tungsten Deposited with Different Techniques

2009 · Annamaria Votta, Francesco Pipia, et al. · Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena · 4

All-Wet Stripping of FEOL Photoresist Using Mixtures of Sulphuric Acid

2007 · Enrico Bellandi, Mauro Alessandri, et al. · Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena · 4

Structural and Chemical Investigation of Annealed Al2O3 Films for Interpoly Dielectric Application in Flash Memories

2006 · Mauro Alessandri, Rossella Piagge, et al. · ECS Transactions · 4

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Metrology issues in thin ONO stacks measurements by spectroscopic ellipsometry and X-ray reflectivity

2004 · E. Bellandi, A. Elbaz, et al. · Thin Solid Films · 4

Behaviour of High-k Dielectric Materials with Classical Cleaning Chemistries

2003 · Enrico Bellandi, Barbara Crivelli, et al. · Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena · 4

Particle Removal Efficiency and Silicon Roughness in HF-DIW/O3/Megasonics Cleaning

1998 · Mauro Alessandri, Enrico Bellandi, et al. · Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena · 4

Fe and Cu Removal Efficiency in HF-DIW/O3 Cleaning Sequence

1998 · Francesco Pipia, Enrico Bellandi, et al. · Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena · 4

Etch Rate Depth Profiling by Single Wafer Etching Equipment

2005 · Enrico Bellandi, Alice C. Elbaz, et al. · Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena · 3

Automated metrology system including VUV spectroscopic ellipsometry and X-ray reflectometry for 300 mm silicon microelectronics

2004 · P Boher, P Evrard, et al. · Thin Solid Films · 3

Automated metrology system including VUV spectroscopic ellipsometry and X-ray reflectometry for 300 mm silicon microelectronics

2004 · P Boher, P Evrard, et al. · Thin Solid Films · 3

Influence of Dry Ashing and Wet Treatments on NVM Metal Gate Structures

2009 · Alice C. Elbaz, Enrico Bellandi, et al. · Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena · 2

AlCu Metal Line Corrosion: A Case Study

2007 · Francesco Pipia, Annamaria Votta, et al. · Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena · 2

Characterization of High-k Dielectrics by Combined Spectroscopic Ellipsometry (SE) and X-Ray Reflectometry (XRR)

2003 · L. Sun, C. Defranoux, et al. · MRS Proceedings · 2

Optimisations of SC-1 Conditions for Sub 0.18μm Technologies in an Industrial Environment

2001 · Sébastien Petitdidier, H. Bernard, et al. · Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena · 2

All-Wet Stripping of FEOL Photoresist Using Mixtures of Sulphuric Acid

2007 · Enrico Bellandi, Mauro Alessandri, et al. · Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena · 1

Etch Rate Profile Characterization of High-κ Materials

2007 · Annamaria Votta, Enrico Bellandi, et al. · Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena · 1

Impact of RF Oxygen Plasma on Thermal Oxide Etch-Rate

2007 · Enrico Bellandi, Annamaria Votta, et al. · Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena · 1

Study of SiO2 Modifications Induced by Oxygen Plasmas and Their Effect on Wet Processes

2007 · Annamaria Votta, Enrico Bellandi, et al. · ECS Transactions · 1

High-k Materials in Flash Memories

2006 · Mauro Alessandri, Rossella Piagge, et al. · ECS Meeting Abstracts · 1

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Works count: 36

Citation count: 135

H-index: 5

I10-index: 4