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Jinhwan Byeon

ORCID: 0000-0002-9715-8861
Observed ORCID: 0000-0002-9715-8861
OpenAlex ID: A5042552242
Solubility-Enhancing Hydrotrope Electrolyte with Tailor-Made Organic Redox-Active Species for Redox-Enhanced Electrochemical Capacitors
2023 · Jinhwan Byeon, Jinhyuck Ko, et al. · ACS Energy Letters · 24
Etchant‐Free Dry‐Developable Extreme Ultraviolet Photoresist Materials Utilizing N‐Heterocyclic Carbene–Metal Complexes
2025 · Dowon Kim, Jinhwan Byeon, et al. · Small · 8
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Bifunctional Urea–Polyethyleneimine‐Mediated Surface Engineering in SnO2 Electron‐Transport Layer for Efficient and Stable Organic Solar Cells
2024 · Dowon Kim, Sanseong Lee, et al. · Solar RRL · 8
Acetal-Functionalized Indacenodithiophene (IDT): Controlling the Position of a Lewis Acidic Dopant for Improved Thermoelectricity
2023 · Jinhwan Byeon, Dowon Kim, et al. · Chemistry of Materials · 6
Molecular engineering of redox electrolytes for size-matched interfacial coupling with microporous carbon in redox-enhanced electrochemical capacitors
2025 · Young Hun Cho, Jinhwan Byeon, et al. · Chemical Engineering Journal · 5
Addressing Intrinsic Limitations of Aqueous Electric Double-Layer Capacitors with Designer Redox-Active Deep Eutectic Solvent Electrolytes
2024 · Jinhyuck Ko, Jinhwan Byeon, et al. · ACS Applied Energy Materials · 5
Patterning of metal acetylacetonate complex via extreme-ultraviolet light-induced chemical reaction and straightforward thermal development process
2024 · Jinhwan Byeon, Dowon Kim, et al. · Materials Today Chemistry · 3
Solution‐Processed and Transparent Graphene Oxide/TiOx Gas Barrier via an Interfacial Photocatalytic Reduction
2020 · Jinhwan Byeon, Jong‐Hoon Lee, et al. · Advanced Materials Interfaces · 2
Irradiation-Source-Dependent Tone Conversion in Dry-Deposited Halogenated Amorphous Zeolitic Imidazolate Framework Resistsfor Electron-Beam and Extreme Ultraviolet Lithography
2026 · Jinhwan Byeon, Nick Gys, et al. · ACS Applied Materials & Interfaces
Dry extreme ultraviolet lithography via N-heterocyclic carbene-metal complexes and etchant-free thermal development
2024 · Dowon Kim, Sukwon Hong, et al. · International Conference on Extreme Ultraviolet Lithography
Works count: 10
Citation count: 61
H-index: 5
I10-index: 1
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