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J. W. Park

Observed names: Jung Woo Park, Jung Woo, Park, Jung-Woo Park
ORCID: 0009-0002-6576-2690
Observed ORCID: 0009-0002-6576-2690
OpenAlex ID: A5042844692
Half-metallic CrO2 thin films on Pt/TiO2/SiO2/Si substrates by chemical vapor deposition
2004 · J. Y. Son, S. H. Bang, et al. · Journal of Applied Physics · 9
Ultra Thin SiO2 Mask Layer for Nano-Scale Selective-Area Pecvd of Si
1996 · J. W. Park, T. Yasuda, et al. · MRS Proceedings · 5
High-Temperature Atomic Layer Deposition of Thermal-Oxide-Quality SiO 2 Using Methyltrichlorosilane
2026 · Okhyeon Kim, Jae-Seok An, et al. · ACS Applied Electronic Materials · 3
Binary thermal atomic layer deposition of ternary silicon carbonitride films using methyltrichlorosilane and ammonia
2026 · Kim, Okhyeon, CHOWDHURY, TANZIA, et al. · Zenodo (CERN European Organization for Nuclear Research)
Ligand Effects in Niobium Precursors for Atomic Layer Deposition of Niobium Oxide Films
2025 · Cha-Hee Kim, Khabib Khumaini, et al. · ECS Journal of Solid State Science and Technology
Works count: 5
Citation count: 17
H-index: 3
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