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Aaron L. Routzahn
Observed name:
Aaron Routzahn
Institution:
Lam Research (United States)
Observed institutions:
West Virginia University,
University of Illinois Urbana-Champaign,
Lam Research (Austria),
University of Colorado Boulder,
Lam Research (United States)
ORCID:
0000-0001-8938-5442
Observed ORCID:
0000-0001-8938-5442
OpenAlex ID:
A5047813348
Thermal atomic layer etching: A review
2021
·
Andreas Fischer
, Aaron Routzahn
, et al.
·
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
·
134
Plasmonics with Doped Quantum Dots
2012
·
Aaron L. Routzahn
, Sarah L. White
, et al.
·
Israel Journal of Chemistry
·
64
Single-Nanocrystal Reaction Trajectories Reveal Sharp Cooperative Transitions
2014
·
Aaron L. Routzahn
, Prashant K. Jain
·
Nano Letters
·
59
Progress report on high aspect ratio patterning for memory devices
2023
·
Meihua Shen
, Thorsten Lill
, et al.
·
Japanese Journal of Applied Physics
·
54
PDF
Luminescence Blinking of a Reacting Quantum Dot
2015
·
Aaron L. Routzahn
, Prashant K. Jain
·
Nano Letters
·
40
Thermal etching of AlF3 and thermal atomic layer etching of Al2O3
2020
·
Andreas Fischer
, Aaron Routzahn
, et al.
·
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
·
25
Fabrication of 3D Metal Dot Arrays by Geometrically Structured Dynamic Shadowing Lithography
2011
·
Shengrong Ye
, Aaron L. Routzahn
, et al.
·
Langmuir
·
13
Control of etch profiles in high aspect ratio holes via precise reactant dosing in thermal atomic layer etching
2022
·
Andreas Fischer
, Aaron Routzahn
, et al.
·
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
·
9
Causes of anisotropy in thermal atomic layer etching of nanostructures
2020
·
Andreas Fischer
, Aaron Routzahn
, et al.
·
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
·
6
Surface reaction modelling of thermal atomic layer etching on blanket hafnium oxide and its application on high aspect ratio structures
2022
·
Andreas Fischer
, David Mui
, et al.
·
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
·
5
Enabling High Aspect Ratio 3D NAND Scaling through Deposition and Etch Co-Optimization (DECO)
2022
·
Meihua Shen
, John Hoang
, et al.
·
ECS Meeting Abstracts
·
3
Thermal Isotropic Atomic Layer Etching of Metallic Molybdenum
2020
·
Andreas Fischer
, Aaron Routzahn
, et al.
·
ECS Meeting Abstracts
·
2
(Invited) Transport and Reaction Kinetics of Thermal ALE in High Aspect Ratio Hafnium Oxide Structures
2022
·
Andreas Fischer
, David Mui
, et al.
·
ECS Meeting Abstracts
Isotropic Atomic Layer Etching in High Aspect Ratio Structures
2021
·
Andreas Fischer
, Paul Lemaire
, et al.
·
ECS Meeting Abstracts
Holistic Integrated Process Solutions for Patterning Phase Change Memory Devices
2021
·
John Hoang
, Meihua Shen
, et al.
·
ECS Meeting Abstracts
(Invited) Characterization of Isotropic Thermal ALE of Oxide Films in Nanometer-Size Structures
2019
·
Andreas Fischer
, Aaron Routzahn
, et al.
·
ECS Meeting Abstracts
Single nanocrystal microscopy and spectroscopy unveils hidden mechanistic information in cation exchange
2016
·
Aaron Routzahn
·
Illinois Digital Environment for Access to Learning and Scholarship (University of Illinois at Urbana-Champaign)
Geometrically Structured Dynamic Shadowing Lithography: Structural Growth and Control
2012
·
Shengrong Ye
, Aaron Routzahn
, et al.
·
Bulletin of the American Physical Society
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Works count:
18
Citation count:
414
H-index:
8
I10-index:
7
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