Get started
Author

Yongyu Wu

Observed name: Wu, Yongyu
Institution: Zhejiang University
OpenAlex ID: A5048218135
Reliability challenges in CMOS technology: A manufacturing process perspective
2023 · Qiao Teng, Yongkang Hu, et al. · Microelectronic Engineering · 27
The working principle, structural design and material development of ferroelectric field-effect transistors and random-access memories
2024 · Yanning Chen, Senlin Wang, et al. · Journal of Alloys and Compounds · 15
A Novel Dual-Bit Charge Trapping Flash Cell with Operation Optimization for Standalone and Embedded Universal Applications
2024 · Zhexuan Li, Xiao Yu, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 6
Low-Noise Te/MoTe2 Heterojunction Waveguide-Integrated Photodetector
2024 · Hui Ma, Shuo Lin, et al. · ACS Photonics · 6
Hot Carrier Degradation-Induced Variability in Different Lightly Doped Drain Processes: From Transistors to SRAM Cells
2024 · Qiao Teng, Yongyu Wu, et al. · IEEE Transactions on Electron Devices · 5
Recent Progress in Sub‐10 Nm Nanofabrication for Scaling Down 2D Transistors
2025 · Haichuan Li, Yongyu Wu, et al. · Advanced Electronic Materials · 4
Investigation of L-shaped split-gate eFlash memory with enhanced gate coupling in a 55 nm node
2025 · Wanyi Ling, Kun Ren, et al. · Applied Physics Letters · 4
GMUNet-ILT: A lightweight MLP-based network for Inverse Lithography Technology
2025 · Ke Wang, Kun Ren, et al. · International Symposium of Electronics Design Automation (ISEDA) · 3
Enhanced SEM Image Denoising via U-Net Based GAN Using Multi-Die Single Frame Images
2025 · Yanjiang Li, Zhiping Mou, et al. · International Symposium of Electronics Design Automation (ISEDA) · 2
Comprehensive Study of the Impact of LWR on Device Performance in VLSI Technology
2024 · Yaoting Wang, Yongyu Wu, et al. · IEEE Transactions on Semiconductor Manufacturing · 2
Optimization of Impact Ionization in Metal–Oxide–Semiconductor Field-Effect Transistors for Improvement of Breakdown Voltage and Specific On-Resistance
2024 · Yanning Chen, Yixian Song, et al. · Electronics · 2
PDF
End-to-End Lithography Modeling Based on Process Parameters and Deep Learning
2024 · Zebang Lin, Kun Ren, et al. · International Symposium of Electronics Design Automation (ISEDA) · 2
Exploring the Effect of Gate Oxide Process on Electrical Performance of CMOS Device
2024 · Yongkang Hu, Qiao Teng, et al. · China Semiconductor Technology International Conference (CSTIC) · 2
Mechanistic Optimization of Spacer-Type Split-Gate Flash Balancing Yield and Performance
2026 · Wanyi Ling, Dianyu Qi, et al. · IEEE Transactions on Electron Devices · 1
A Process-Robust Split-Gate eFlash Memory With Spacer-Defined Floating Gate in 55-nm Node
2026 · Wanyi Ling, Kun Ren, et al. · IEEE Transactions on Device and Materials Reliability · 1
A Heterogeneous Integration Architecture for Broadband (DUV-Visible) CMOS Image Sensor
2025 · Jinfu Zhang, Yongyu Wu, et al. · IEEE Electron Device Letters · 1
Considerations for Low Temperature High-Performance Computing: Design Technology Co-optimization, Device Variation, and Hot Carrier Injection
2025 · Yuanxi Liao, Keyang Zhu, et al. · IEEE International Conference on ASIC (ASICON) · 1
Investigation of Design Technology Co-optimization (DTCO) for Low-Temperature High Performance Computing CMOS Technology Based on The Calibrated Low Temperature TCAD-SPICE Method
2025 · yuanxi Liao, Yongyu Wu, et al. · International Conference on Solid State Devices and Materials (SSDM) · 1
UNeXt-ILT: fast and global context-aware inverse lithography solution
2025 · Zebang Lin, Kun Ren, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 1
AtomTool: Empowering Large Language Models with Tool Utilization Skills
2024 · Yongle Li, Zheng Zhang, et al. · Lecture notes in computer science · 1
Impact of Lightly Doped Drain on Hot Carrier Degradation Variability in N-FETs and SRAM Cells
2024 · Qiao Teng, Yongyu Wu, et al. · IEEE International Reliability Physics Symposium proceedings · 1
The Modeling and Optimization of Line Width Roughness in Polysilicon Gate for Improving the Performance of CMOS Device
2024 · Yaoting Wang, Mengshu Kong, et al. · China Semiconductor Technology International Conference (CSTIC) · 1
Test Pattern Sampling Methodology for Model Tuning Efficiency and Robustness Improvement
2023 · Lingxue Yang, Kun Ren, et al. · International Workshop on Advanced Patterning Solutions (IWAPS) · 1
Challenges and Opportunities of China’s IC Industry in The Post-Moore Era: Role of The Integration between Industry and Education in Supporting The Interdisciplinary Technology Transformation
2022 · Ran Cheng, Qiao Teng, et al. · IEEE International Conference on Solid-State and Integrated Circuit Technology · 1
LWR-driven hot carrier degradation-induced variability in CMOS devices: mechanisms and mitigation
2026 · Yaoting Wang, Yongyu Wu, et al. · Microelectronic Engineering
Works count: 57
Citation count: 91
H-index: 5
I10-index: 2
Year
Topic
Type