Author

Yasuki Akimoto

Institution: Oita Industrial Research Institute

Observed institution: Oita Industrial Research Institute

ORCID: 0000-0001-8373-4429

Observed ORCID: 0000-0001-8373-4429

OpenAlex ID: A5048267232

Evaluation of photocatalytic activity, water contact angle, and annealing for TiO2 thin films deposited with mixed WOX–SiO2 thin films using radiofrequency sputtering

2023 · Tomoaki Miyagi, Yoshiro Takahashi, et al. · Journal of Applied Physics · 6

Effects of substrate temperature and sputtering gas composition on physical properties and photocatalytic activities of WO x thin films deposited via radiofrequency sputtering

2022 · Tomoaki Miyagi, Yoshiro Takahashi, et al. · Japanese Journal of Applied Physics · 4

Characterization of photocatalytic hybrid TiO2–WOX thin films deposited via co-sputtering

2023 · Tomoaki Miyagi, Yoshiro Takahashi, et al. · Thin Solid Films · 3

Effects on the photocatalytic activity and the wettability of depositing WO x thin films and WO x -SiO 2 composite thin films on the TiO 2 surface by RF sputtering

2021 · Tomoaki Miyagi, Yoshiro Takahashi, et al. · The Japan Society of Applied Physics

Works count: 4

Citation count: 13

H-index: 3

I10-index: