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Author

Martin Čada

Observed names: Cada, Martin, M Cada, M Čada, M. CADA, M. Cada, M. Čada, Martin CADA, Martin Cada, Čada, Martin
Observed institutions: University of Liverpool, University of Iceland, Czech Academy of Sciences, Charles University, University of South Bohemia in České Budějovice, Czech Academy of Sciences, Institute of Plasma Physics, Regional Centre of Advanced Technologies and Materials, FZU - Institute of Physics of the Czech Academy of Sciences, Czech Technical University in Prague, Palacký University Olomouc, KTH Royal Institute of Technology
ORCID: 0000-0001-6826-983X
Observed ORCID: 0000-0001-6826-983X
OpenAlex ID: A5049755365
Microstructural control of TiC/a-C nanocomposite coatings with pulsed magnetron sputtering
2007 · Y.T. Pei, C.Q. Chen, et al. · Acta Materialia · 154
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Photoanodes with Fully Controllable Texture: The Enhanced Water Splitting Efficiency of Thin Hematite Films Exhibiting Solely (110) Crystal Orientation
2015 · Stepan Kment, Patrik Schmuki, et al. · ACS Nano · 130
Investigation of ionized metal flux fraction in HiPIMS discharges with Ti and Ni targets
2013 · Tomáš Kubart, Martin Čada, et al. · Surface and Coatings Technology · 89
Ionization of sputtered Ti, Al, and C coupled with plasma characterization in HiPIMS
2015 · Daniel Lundin, Martin Čada, et al. · Plasma Sources Science and Technology · 83
The Effect of Magnetic Field Strength and Geometry on the Deposition Rate and Ionized Flux Fraction in the HiPIMS Discharge
2019 · Hamidreza Hajihoseini, Martin Čada, et al. · Plasma · 68
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Time-resolved investigation of dual high power impulse magnetron sputtering with closed magnetic field during deposition of Ti–Cu thin films
2010 · Vitezslav Stranak, Martin Cada, et al. · Journal of Applied Physics · 67
Barrier-torch discharge plasma source for surface treatment technology at atmospheric pressure
2002 · Z Hubicka, M Cada, et al. · Plasma Sources Science and Technology · 67
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Physical properties of homogeneous TiO2films prepared by high power impulse magnetron sputtering as a function of crystallographic phase and nanostructure
2009 · Vítězslav Straňák, Martin Čada, et al. · Journal of Physics D Applied Physics · 56
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Photoelectrochemical and structural properties of TiO 2 nanotubes and nanorods grown on FTO substrate: Comparative study between electrochemical anodization and hydrothermal method used for the nanostructures fabrication
2016 · Hana Kmentova, Stepan Kment, et al. · Catalysis Today · 55
Deposition of hematite Fe2O3 thin film by DC pulsed magnetron and DC pulsed hollow cathode sputtering system
2013 · Z. Hubička, Š. Kment, et al. · Thin Solid Films · 51
Measurement of energy transfer at an isolated substrate in a pulsed dc magnetron discharge
2007 · M. Čada, J. W. Bradley, et al. · Journal of Applied Physics · 50
On the improvement of PEC activity of hematite thin films deposited by high-power pulsed magnetron sputtering method
2014 · S. Kment, Z. Hubicka, et al. · Applied Catalysis B: Environmental · 46
Time-resolved plasma parameters in the HiPIMS discharge with Ti target in Ar/O2 atmosphere
2010 · Martin Čada, Zdeněk Hubička, et al. · Surface and Coatings Technology · 46
Time-resolved optical emission spectroscopy of a unipolar and a bipolar pulsed magnetron sputtering discharge in an argon/oxygen gas mixture with a cobalt target
2019 · R Hippler, M Cada, et al. · Plasma Sources Science and Technology · 44
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Cobalt Oxide Catalysts in the Form of Thin Films Prepared by Magnetron Sputtering on Stainless-Steel Meshes: Performance in Ethanol Oxidation
2019 · Květa Jirátová, Roman Perekrestov, et al. · Catalysts · 44
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Deposition of rutile (TiO2) with preferred orientation by assisted high power impulse magnetron sputtering
2013 · Vitezslav Stranak, Ann-Pierra Herrendorf, et al. · Surface and Coatings Technology · 44
Tailoring properties of indium tin oxide thin films for their work in both electrochemical and optical label-free sensing systems
2021 · P. Sezemsky, D. Burnat, et al. · Sensors and Actuators B Chemical · 43
Time-resolved Langmuir probe diagnostics of a bipolar high power impulse magnetron sputtering discharge
2020 · Rainer Hippler, Martin Cada, et al. · Applied Physics Letters · 43
Effect of mid-frequency discharge assistance on dual-high power impulse magnetron sputtering
2011 · Vitezslav Stranak, Steffen Drache, et al. · Surface and Coatings Technology · 43
Time-resolved diagnostics of a bipolar HiPIMS discharge
2020 · Rainer Hippler, Martin Cada, et al. · Journal of Applied Physics · 40
Ionized vapor deposition of antimicrobial Ti–Cu films with controlled copper release
2013 · Vitezslav Stranak, Harm Wulff, et al. · Thin Solid Films · 39
Time-resolved tunable diode laser absorption spectroscopy of excited argon and ground-state titanium atoms in pulsed magnetron discharges
2012 · V Sushkov, H T Do, et al. · Plasma Sources Science and Technology · 37
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Photo-induced electrochemical functionality of the TiO2 nanoscale films
2008 · S. Kment, P. Kluson, et al. · Electrochimica Acta · 37
Ion energy distributions at substrate in bipolar HiPIMS: effect of positive pulse delay, length and amplitude
2020 · Tomáš Kozák, Andrea Dagmar Pajdarová, et al. · Plasma Sources Science and Technology · 36
Pressure dependence of singly and doubly charged ion formation in a HiPIMS discharge
2019 · R. Hippler, M. Cada, et al. · Journal of Applied Physics · 36
Works count: 169
Citation count: 2,837
H-index: 30
I10-index: 83
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