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Surin An
Observed names:
S AN,
Su-Rin An
Institution:
Myongji University
Observed institution:
Myongji University
ORCID:
0000-0001-7582-6147
Observed ORCID:
0000-0001-7582-6147
OpenAlex ID:
A5050217617
Spectroscopic Analysis of NF3 Plasmas with Oxygen Additive for PECVD Chamber Cleaning
2023
·
Surin An
, Sang Jeen Hong
·
Coatings
·
23
PDF
An in situ monitoring method for PECVD process equipment condition
2018
·
G KANG
, S AN
, et al.
·
Plasma Science and Technology
·
19
Eco-Friendly Dry-Cleaning and Diagnostics of Silicon Dioxide Deposition Chamber
2024
·
Surin An
, Jeong Eun Choi
, et al.
·
IEEE Transactions on Semiconductor Manufacturing
·
14
Plasma Ion Bombardment Induced Heat Flux on the Wafer Surface in Inductively Coupled Plasma Reactive Ion Etch
2023
·
Sung Il Cho
, Hyun Keun Park
, et al.
·
Applied Sciences
·
13
PDF
In-situ process monitoring for eco-friendly chemical vapor deposition chamber cleaning
2021
·
Su-Rin An
, Jeong Eun Choi
, et al.
·
Journal of the Korean Physical Society
·
9
Explainable artificial intelligence-based evidential inferencing on process faults in plasma etching
2024
·
Jeong Eun Choi
, Surin An
, et al.
·
Journal of Physics D Applied Physics
·
7
Characterization of PECVD Si3N4 thin film in multiple oxide–nitride stack for 3D-NAND flash memory
2023
·
Jaekeun Baek
, Surin An
, et al.
·
Semiconductor Science and Technology
·
3
Influence of Flow Rates and Flow Times of Plasma-Enhanced Atomic Layer Deposition Purge Gas on TiN Thin Film Properties
2024
·
Ju Eun Kang
, Surin An
, et al.
·
Coatings
·
1
PDF
Machine Learning-Based Integrated Database System for Plasma-Enhanced Chemical Vapor Deposition Fault Diagnosis
2024
·
Younji Lee
, Jeong Eun Choi
, et al.
·
Applied Science and Convergence Technology
PDF
Kinetic Mechanism of Reactive Oxygen/Nitrogen Species in Plasma-Assisted Greenhouse Gas Replacement
2021
·
Seonbyul Lee
, Surin An
, et al.
·
Science of Advanced Materials
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Works count:
10
Citation count:
89
H-index:
6
I10-index:
4
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