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Stéphane Guilet

Observed names: Guilet, S., Guilet, Stephane, Guilet, Stéphane, S Guilet, S. Guilet, Stephan Guilet, Stephane Guilet, Ste´phane Guilet
Observed institutions: Université Paris-Sud, École Centrale de Lyon, Centre National de la Recherche Scientifique, École Centrale Paris, Université Paris-Saclay, Sorbonne Université, Institut des Matériaux Jean Rouxel, Centre de Nanosciences et de Nanotechnologies, Laboratoire d'Énergétique Moléculaire et Macroscopique, Combustion, Institut des NanoSciences de Paris, Laboratoire Photonique, Numérique et Nanosciences, Fédération de Recherche Spectroscopies de Photoémission, Université de Nantes, Université Pierre-et-Marie-Curie, Nantes Université
ORCID: 0000-0003-1054-5031
Observed ORCID: 0000-0003-1054-5031
OpenAlex ID: A5052198069
The LUCIA beamline at SOLEIL
2016 · D. Vantelon, N. Trcera, et al. · Journal of Synchrotron Radiation · 124
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Sidewall passivation assisted by a silicon coverplate during Cl2–H2 and HBr inductively coupled plasma etching of InP for photonic devices
2008 · S. Bouchoule, G. Patriarche, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 52
Continuous-wave operation of photonic band-edge laser near 1.55 µm on silicon wafer
2007 · G. Vecchi, F. Raineri, et al. · Optics Express · 51
Development of ion sources from ionic liquids for microfabrication
2010 · Carla Perez-Martinez, Stéphane Guilet, et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 49
Optimization of a Cl2–H2 inductively coupled plasma etching process adapted to nonthermalized InP wafers for the realization of deep ridge heterostructures
2006 · S. Guilet, S. Bouchoule, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 48
Surface loss rates of H and Cl radicals in an inductively coupled plasma etcher derived from time-resolved electron density and optical emission measurements
2010 · G. A. Curley, L. Gatilova, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 40
FIB patterning of dielectric, metallized and graphene membranes: A comparative study
2014 · A. Hemamouche, A. Morin, et al. · Microelectronic Engineering · 34
GaN nanowires for piezoelectric generators
2014 · Noelle Gogneau, Pascal Chrétien, et al. · physica status solidi (RRL) - Rapid Research Letters · 33
Anisotropic and Smooth Inductively Coupled Plasma Etching of III-V Laser Waveguides Using HBr-O[sub 2] Chemistry
2008 · S. Bouchoule, S. Azouigui, et al. · Journal of The Electrochemical Society · 32
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Impact of the GaN nanowire polarity on energy harvesting
2014 · Noelle Gogneau, Pascal Chrétien, et al. · Applied Physics Letters · 31
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Ultrafast terahertz detectors based on three-dimensional meta-atoms
2017 · B. Paulillo, S. Pirotta, et al. · Optica · 29
Stainless steel patterning by combination of micro-patterning and driven strain produced by plasma assisted nitriding
2011 · Gregory Marcos, Stephane Guilet, et al. · Surface and Coatings Technology · 29
Ionic liquid ion sources as a unique and versatile option in FIB applications
2010 · Carla Perez-Martinez, Stéphane Guilet, et al. · Microelectronic Engineering · 29
Efficient coupling to W1 photonic crystal waveguide on InP membrane through suspended access guides
2008 · A. Talneau, K. H. Lee, et al. · Applied Physics Letters · 29
Investigation of InP etching mechanisms in a Cl2/H2 inductively coupled plasma by optical emission spectroscopy
2009 · L. Gatilova, S. Bouchoule, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 27
Smooth sidewall in InP-based photonic crystal membrane etched by N2-based inductively coupled plasma
2008 · K. H. Lee, S. Guilet, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 26
Inductively coupled plasma etching of GaAs suspended photonic crystal cavities
2009 · R. Braive, L. Le Gratiet, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 23
Ionic liquid ion sources for silicon reactive machining
2010 · S. Guilet, C. Perez-Martinez, et al. · Microelectronic Engineering · 22
Antimonide-based lasers and DFB laser diodes in the 2–2.7 μm wavelength range for absorption spectroscopy
2007 · D. Barat, J. Angellier, et al. · Applied Physics B · 19
Guided-mode resonator for thin InGaAs P-i-N short-wave infrared photo-diode
2016 · Michaël Verdun, Benjamin Portier, et al. · Applied Physics Letters · 18
Laterally coupled distributed feedback lasers emitting at 2 μm with quantum dash active region and high-duty-cycle etched semiconductor gratings
2017 · Konstantinos Papatryfonos, Dzianis Saladukha, et al. · Journal of Applied Physics · 16
Analysis of Ti–Si–N diffusion barrier films obtained by r.f. magnetron sputtering
2000 · L Le Brizoual, S Guilet, et al. · Microelectronic Engineering · 14
X-ray photoelectron spectroscopy analysis of the effect of temperature upon surface composition of InP etched in Cl2-based inductively coupled plasma
2014 · Romain Chanson, Sophie Bouchoule, et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 13
On the Mechanism of In Nanoparticle Formation by Exposing ITO Thin Films to Hydrogen Plasmas
2017 · Zheng Fan, Jean-Luc Maurice, et al. · Langmuir · 11
Quantum dash based lasers for gas sensing
2014 · Konstantinos Papatryfonos, Siddarth Joshi, et al. · Conference proceedings. ... International Conference on Indium Phosphide and Related Materials · 11
Works count: 80
Citation count: 937
H-index: 19
I10-index: 26
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