Author

Vahid Ghodsi

Institutions: University of Colorado Boulder, University of Colorado System

Observed institutions: Western University, University of Colorado Boulder, University of Colorado System, Trojan Technologies (Canada)

ORCID: 0000-0002-2925-7833

Observed ORCID: 0000-0002-2925-7833

OpenAlex ID: A5053283544

Low-temperature etching of silicon oxide and silicon nitride with hydrogen fluoride

2024 · Thorsten Lill, Mingmei Wang, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 43

Enhancing sludge dewaterability and phosphate removal through a novel chemical dosing strategy using ferric chloride and hydrogen peroxide

2020 · Vahid Ghodsi, Siva R. Sarathy, et al. · Water Environment Research · 11

Physico‐chemical characteristics and biodegradability of primary effluent and particulate matter removed by microscreens

2023 · Sanaz Alizadeh, Pankaj Chowdhury, et al. · Water Environment Research · 8

Works count: 3

Citation count: 62

H-index: 3

I10-index: 2