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Author

Yuki Itoya

Observed name: Yuki ITOYA
Observed institution: The University of Tokyo
ORCID: 0009-0001-9105-5407
Observed ORCID: 0009-0001-9105-5407
OpenAlex ID: A5054508385
Nondestructive imaging of breakdown process in ferroelectric capacitors using in situ laser-based photoemission electron microscopy
2023 · Hirokazu Fujiwara, Yuki Itoya, et al. · Applied Physics Letters · 9
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Dielectric breakdown behavior of ferroelectric HfO2 capacitors by constant voltage stress studied by in situ laser-based photoemission electron microscopy
2024 · Yuki Itoya, Hirokazu Fujiwara, et al. · Japanese Journal of Applied Physics · 5
Nanosheet oxide semiconductor FETs with ALD InZnO x compared to InGaO x
2025 · Sung-Hun Kim, Kaito Hikake, et al. · Japanese Journal of Applied Physics · 2
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Energy-efficient Annealing Process of HfO2-based Ferroelectric Capacitor using UV-LED for Green Manufacturing
2023 · Hirotaka Yamada, Satoru Furue, et al. · IEEE Electron Devices Technology & Manufacturing Conference (EDTM) · 2
Reliability improvement of InGaO x FETs by adding Zn in atomic layer deposition process
2025 · Kota Sakai, Kaito Hikake, et al. · Japanese Journal of Applied Physics · 1
Breakdown and polarization contrasts in ferroelectric devices observed by operando laser-based photoemission electron microscopy with the AC/DC electrical characterization system
2025 · Hirokazu Fujiwara, Yuki Itoya, et al. · Ultramicroscopy · 1
Enhanced reliability of ferroelectric Hf0.5Zr0.5O2 capacitors by bottom electrode surface oxidation
2024 · Yuki Itoya, Takuya Saraya, et al. · Japanese Journal of Applied Physics · 1
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Device modeling of oxide–semiconductor channel antiferroelectric FETs using half-loop hysteresis for memory operation
2022 · Xingyu Huang, Yuki Itoya, et al. · Japanese Journal of Applied Physics · 1
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Observation and statistical analysis of leakage path formation in HfO2-basedferroelectric capacitors using in-situ laser-based photoemission electron microscopy
2026 · Yuki Itoya, Hirokazu Fujiwara, et al. · International Conference on Solid State Devices and Materials (SSDM)
Electric-field dependence of cycle endurance in HfO2-based ferroelectric capacitors
2026 · Yuki Itoya, Takuya Saraya, et al. · Journal of Applied Physics
"Multi-Filament Distributions in HfO2-based Ferroelectric Capacitors Observed by InSitu Laser-Based Photoemission Electron M"
2026 · Yuki Itoya · IEEE DataPort
Evidence for Structure- and Electric-Field-Induced Mode Crossover in Multi-Filament Formation in HfO 2 -Based Ferroelectric Capacitors by In-Situ Laser PEEM
2026 · Yuki Itoya, Hirokazu Fujiwara, et al. · IEEE Electron Devices Technology & Manufacturing Conference (EDTM)
Analysis of reliability improvement in HfO2-based ferroelectric capacitorsby ozone oxidation of the bottom electrode
2024 · Yuki Itoya, Takuya Saraya, et al. · International Conference on Solid State Devices and Materials (SSDM)
Energy-Efficient Annealing Process of Ferroelectric Hf0.5Zr0.5O2 Capacitor Using Ultraviolet-LED for Green Manufacturing
2024 · Hirotaka Yamada, Satoru Furue, et al. · IEEE Journal of the Electron Devices Society
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Modeling and Simulation of Antiferroelectric FETs with Oxide Semiconductor Channel Using Half-Loop Hysteresis for Memory Applications
2022 · Xingyu HUANG, Yuki ITOYA, et al. · International Conference on Solid State Devices and Materials (SSDM)
Works count: 15
Citation count: 22
H-index: 2
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