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Sabrina Kohler

Truly Innovative 28nm FDSOI Technology for Automotive Micro-Controller Applications embedding 16MB Phase Change Memory
2018 · F. Arnaud, P. Zuliani, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 89
32nm general purpose bulk CMOS technology for high performance applications at low voltage
2008 · F. Arnaud, J. Liu, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 57
Competitive and cost effective high-k based 28nm CMOS technology for low power applications
2009 · F. Arnaud, A. Thean, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 47
28FDSOI technology for low-voltage, analog and RF applications
2016 · Nicolas Planes, S. Kohler, et al. · IEEE International Conference on Solid-State and Integrated Circuit Technology · 15
New layout dependency in high-k/Metal Gate MOSFETs
2011 · M. Hamaguchi, D. Nair, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 14
Technology-circuit convergence for full-SOC platform in 28 nm and beyond
2011 · F. Arnaud, S. Colquhoun, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 13
32nm device architecture optimization for critical path speed improvement
2008 · R. Gwoziecki, S. Kohler, et al. · Symposium on VLSI Technology · 5
High-K/Metal Gate MOSFETsにおける新しいレイアウト依存性(IEDM特集(先端CMOSデバイス・プロセス技術))
2012 · 雅史 濱口, Deleep R. Nair, et al. · Medical Entomology and Zoology
High-K/Metal Gate MOSFETs における新しいレイアウト依存性
2012 · 雅史 濱口, Deleep R. Nair, et al. · Medical Entomology and Zoology
Novel High-Performance Analog Devices for Advanced Low-Power High-k Metal Gate Complementary Metal–Oxide–Semiconductor Technology
2011 · Jin-Ping Han, Takashi Shimizu, et al. · Japanese Journal of Applied Physics
Novel High-Performance Analog Devices for Advanced Low-Power High-kMetal Gate Complementary Metal–Oxide–Semiconductor Technology
2011 · Jin-Ping Han, Takashi Shimizu, et al. · Japanese Journal of Applied Physics
Cost Efficient Novel High Performance Analog Devices Integrated with Advanced HKMG Scheme for 28nm CMOS Technology and Beyond
2010 · J. P. Han, T. Shimizu, et al. · International Conference on Solid State Devices and Materials (SSDM)
Effect of Poly/SiON Gate Stack Combined with Thin BOX and Ground Plane for Low Vth and Analog Applications of FDSOI Devices
2008 · C. Fenouillet-Beranger, P. Perreau, et al. · International Conference on Solid State Devices and Materials (SSDM)
Works count: 13
Citation count: 240
H-index: 6
I10-index: 6
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