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Robert A. Bergstedt

Observed names: BERGSTEDT, ROBERT A., R. Bergstedt, Robert Bergstedt
OpenAlex ID: A5055731661
Laser produced plasma EUV sources for device development and HVM
2012 · David C. Brandt, Igor V. Fomenkov, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 18
LPP source system development for HVM
2011 · David C. Brandt, Igor V. Fomenkov, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 14
Laser produced plasma light source for EUVL
2011 · Igor V. Fomenkov, Alex I. Ershov, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10
OPO-based compact laser projection display
2001 · Dicky Lee, Peter F. Moulton, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9
XLR 500i: recirculating ring ArF light source for immersion lithography
2007 · D.J. W. Brown, P. O'Keeffe, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
CO2/Sn LPP EUV sources for device development and HVM
2013 · David C. Brandt, Igor V. Fomenkov, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
Laser Digital Cinema
2001 · Eric B. Takeuchi, Graham W. Flint, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
XLR 600i: recirculating ring ArF light source for double patterning immersion lithography
2008 · Vladimir Fleurov, Slava Rokitski, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
XLA-300: the fourth-generation ArF MOPA light source for immersion lithography
2006 · Fedor Trintchouk, Toshihiko Ishihara, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
Microlaser-based displays
1997 · Robert Bergstedt, Charles G. Fink, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
Diode-pumped microlasers for display applications
1998 · David E. Hargis, Robert Bergstedt, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Enabling high volume manufacturing of double patterning immersion lithography with the XLR 600ix ArF light source
2009 · Rostislav Rokitski, Vladimir Fleurov, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
XLA-200: the third-generation ArF MOPA light source for immersion lithography
2005 · Toshihiko Ishihara, Robert Rafac, et al. · Optical Microlithography XVIII · 2
Microlaser-based three-dimensional display
1999 · Eric B. Takeuchi, Robert Bergstedt, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
High-performance microlasers enable display applications
1999 · Eric B. Takeuchi, David E. Hargis, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Solid‐State Laser‐Based Displays
1999 · David E. Hargis, Eric B. Takeuchi, et al. · SID Symposium Digest of Technical Papers · 1
High power EUV LPP
2013 · Daniel J. Brown, Robert J. Rafac, et al. · Conference on Lasers and Electro-Optics
Works count: 19
Citation count: 104
H-index: 7
I10-index: 3
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