Get started
Author

Charles Schlechte

Observed names: C. Schlechte, Schlechte, Charles
Observed institution: Tokyo Electron (Japan)
ORCID: 0000-0002-3317-1776
Observed ORCID: 0000-0002-3317-1776
OpenAlex ID: A5058462399
Characterization of neutral species in an NH3-Ar plasma generated by a capacitively coupled plasma source at various radio frequencies
2023 · S. M. Johnson, J. P. Zhao, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 3
Plasma enhanced atomic layer deposition of silicon nitride and silicon carbonitride using a single source precursor and different plasmas
2025 · Samuel M. Johnson, Jianping Zhao, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1
Works count: 4
Citation count: 4
H-index: 1
I10-index:
Year
Topic
Type