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Yaobin Feng

Efficient source mask optimization method for reduction of computational lithography cycles and enhancement of process-window predictability
2015 · Moran Guo, Zhiyang Song, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 10
Zernike model for overlay control and tool monitor for lithography and etch process
2022 · Libin Zhang, Yaobin Feng, et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 9
Overlay control solution for high aspect ratio etch process induced overlay error
2022 · Enze Ma, Libin Zhang, et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 9
New alignment mark design structures for higher diffraction order wafer quality enhancement
2017 · Libin Zhang, Yaobin Feng, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9
Layout pattern analysis and coverage evaluation in computational lithography
2023 · Yaobin Feng, Zhiyang Song, et al. · Optics Express · 8
Freeform mask optimization using advanced image based M3D inverse lithography and 3D-NAND full chip opc application
2018 · Sam Liu, Jingjing Liu, et al. · SPIE Optical Microlithography · 7
Fast in-device overlay metrology on multi-tier 3DNAND devices without DECAP and it’s applications in process characterization and control
2021 · Yaobin Feng, Pandeng Xuan, et al. · Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV · 5
Efficient measurement and optical proximity correction modeling to catch lithography pattern shift issues of arbitrarily distributed hole layer
2024 · Yaobin Feng, Jiamin Liu, et al. · Frontiers of Mechanical Engineering · 4
Adopting combined feed forward solution in HVM fab to improve on product overlay
2022 · Senmao Zeng, Xue Huang, et al. · Metrology, Inspection, and Process Control XXXVI · 3
Method to improve the overlay image contrast and optimize the sub-segmentation mark
2021 · Libin Zhang, Cong Lu, et al. · Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV · 3
A novel accurate and robust technique in after-etch overlay metrology of 3D-NAND’s memory holes
2020 · Yaobin Feng, Dean Wu, et al. · Metrology, Inspection, and Process Control XXXVI · 3
Overlay mark sub structure design to improve the contrast
2020 · Libin Zhang, Cong Lu, et al. · International Workshop on Advanced Patterning Solutions (IWAPS) · 2
Model based CAOPC flow for memory chips to improve performance and consistency of RET solutions
2020 · Srividya Jayaram, Sherif Hany, et al. · SPIE Optical Microlithography · 2
Feature Vector Effectiveness Evaluation for Pattern Selection in Computational Lithography
2024 · Yaobin Feng, Jiamin Liu, et al. · Photonics · 1
An accurate and robust after-develop overlay measurement solution using YieldStar multi-wavelength optical metrology accompanied by a precise application strategy
2021 · Pengzhen Zhang, Kai You, et al. · Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV · 1
Novel Target Design for Thick Resist Layers Overlay Measurement Improvement
2020 · Chao Fang, Jinyu Qiu, et al. · International Workshop on Advanced Patterning Solutions (IWAPS) · 1
Enhancing the applications space of diffraction based overlay metrology by increasing throughput and target pitch flexibility
2020 · Simon Mathijssen, Herman Heijmerikx, et al. · Metrology, Inspection, and Process Control XXXVI · 1
An Innovative Graphical Platform for Real Time Accurate AEI Overlay Prediction and Rework Control
2021 · Yaobin Feng, JianFeng Li, et al. · China Semiconductor Technology International Conference (CSTIC)
Machine Learning based Optical Proximity Correction Techniques
2020 · Pengpeng Yuan, Taian Fan, et al. · Journal of Microelectronic Manufacturing
Quantifying global and local CD variation for an advanced 3D NAND layer (Conference Presentation)
2019 · Will Conley, Yaobin Feng, et al. · SPIE Optical Microlithography
The design and research of wafer-type tester based on microprocessor
2015 · J.M. Feng, Y.J. Cao & H. Luo · CRC Press eBooks
Works count: 21
Citation count: 78
H-index: 6
I10-index: 1
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